Patents by Inventor Tokio Isago

Tokio Isago has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6798499
    Abstract: An apparatus for depositing an optical thin film at a high accuracy has a vacuum chamber in which a thin film is formed on a substrate by vapor deposition of a material at a target using ion beams from an ion gun, an optical monitor for optically measuring the thickness of the thin film and outputting transmittance data DT, a crystal monitor for measuring a frequency which changes as the deposition proceeds and for outputting frequency data DF, and a determination circuit 12. The determination circuit select between the optical monitor and the crystal monitor to control the thickness of the thin film to be formed on the substrate.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: September 28, 2004
    Assignee: Alps Electric Co., Ltd.
    Inventors: Yuichi Umeda, Yoshihiro Someno, Tokio Isago
  • Publication number: 20030016346
    Abstract: An apparatus for depositing an optical thin film at a high accuracy has a vacuum chamber in which a thin film is formed on a substrate by vapor deposition of a material at a target using ion beams from an ion gun, an optical monitor for optically measuring the thickness of the thin film and outputting transmittance data DT, a crystal monitor for measuring a frequency which changes as the deposition proceeds and for outputting frequency data DF, and a determination circuit 12. The determination circuit select between the optical monitor and the crystal monitor to control the thickness of the thin film to be formed on the substrate.
    Type: Application
    Filed: July 11, 2002
    Publication date: January 23, 2003
    Applicant: ALPS ELECTRIC CO., LTD.
    Inventors: Yuichi Umeda, Yoshihiro Someno, Tokio Isago