Patents by Inventor Tokuhide Nawata

Tokuhide Nawata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pulse shot type flow controller and pulse shot type flow controlling method
    Patent number: 6913031
    Abstract: A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve (12) and, after that, opening/closing operation of a second cutoff valve (17)) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve (17) per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity (13) measure by a pressure sensor (14). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve (17) per unit time.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: July 5, 2005
    Assignee: CKD Corporation
    Inventors: Tokuhide Nawata, Yoshihisa Sudoh, Masayuki Kouketsu, Masayuki Watanabe, Hiroki Doi
  • Pulse shot flow regulator and pulse shot flow regulating method
    Publication number: 20040244837
    Abstract: A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve (12) and, after that, opening/closing operation of a second cutoff valve (17)) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve (17) per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity (13) measure by a pressure sensor (14). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve (17) per unit time.
    Type: Application
    Filed: April 8, 2004
    Publication date: December 9, 2004
    Inventors: Tokuhide Nawata, Yoshihisa Sudoh, Masayuki Kouketsu, Masayuki Watanabe, Hiroki Doi