Patents by Inventor Tokutaro Kimura

Tokutaro Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Film for thermal sterilization packaging
    Patent number: 8257822
    Abstract: Provided is a film for thermal sterilization packaging which is excellent in a total balance of characteristics such a transparency, an impact resistance, a heat sealing property, a blocking resistance, a heat resistance and the like. The film for thermal sterilization packaging according to the present invention is characterized by comprising: an outer layer containing a propylene/ethylene block copolymer (A) which has a melt flow rate (MFR; ASTM D1238, 230° C., load: 2.16 kg) in the range of 1 to 10 g/10 minutes and a melting point in the range of 150 to 170° C. measured by means of a differential scanning colorimeter.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: September 4, 2012
    Assignees: Mitsui Chemicals, Inc., Prime Polymer Co., Ltd.
    Inventors: Mitsuo Kawata, Jun Birukawa, Kunihiko Takesue, Keita Itakura, Tokutaro Kimura
  • PACKAGING PROPYLENE RESIN COMPOSITION
    Publication number: 20090317615
    Abstract: Packaging propylene resin compositions are excellent in balance in high transparency, rigidity, low-temperature impact resistance and blocking resistance. Retort films, protective films, medical container packaging films and freshness-keeping films, and sheets for similar purposes are obtained from the compositions. A packaging propylene resin composition includes a propylene polymer (A) satisfying specific requirements and a propylene/ethylene copolymer (B) satisfying specific requirements. In another packaging propylene resin composition, Dinsol and Dsol satisfy specific requirements.
    Type: Application
    Filed: August 6, 2007
    Publication date: December 24, 2009
    Inventors: Keita Itakura, Tokutaro Kimura, Mitsuo Kawata, Satoshi Hashizume, Masashi Higuchi, Munehito Funaya
  • Propylenic copolymer, and its film
    Patent number: 6649725
    Abstract: Disclosed are a binary random copolymer of propylene and ethylene, and a film to be formed by sheeting the copolymer. The film has good heat-sealability, high stiffness, good anti-blocking and slipping properties, and high transparency. As having excellent heat-sealability at low-temperature, the copolymer and its film are favorably used as sealant layers of laminate films.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: November 18, 2003
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Yasushi Seta, Satoshi Nakatsuka, Michihiro Sawada, Ryoichi Tsunori, Tokutaro Kimura, Yutaka Minami
  • Propylenic copolymer, and its film
    Patent number: 6420021
    Abstract: Disclosed are a binary random copolymer of propylene and ethylene, and a film to be formed by sheeting the copolymer. The film has good heat-sealability, high stiffness, good anti-blocking and slipping properties, and high transparency. As having excellent heat-sealability at low-temperature, the copolymer and its film are favorably used as sealant layers of laminate films.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: July 16, 2002
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Yasushi Seta, Satoshi Nakatsuka, Michihiro Sawada, Ryoichi Tsunori, Tokutaro Kimura, Yutaka Minami
  • PROPYLENIC COPOLYMER, AND ITS FILM
    Publication number: 20010053453
    Abstract: Disclosed are a binary random copolymer of propylene and ethylene, and a film to be formed by sheeting the copolymer. The film has good heat-sealability, high stiffness, good anti-blocking and slipping properties, and high transparency. As having excellent heat-sealability at low-temperature, the copolymer and its film are favorably used as sealant layers of laminate films.
    Type: Application
    Filed: October 14, 1997
    Publication date: December 20, 2001
    Inventors: YASUSHI SETA, SATOSHI NAKATSUKA, MICHIHIRO SAWADA, RYOICHI TSUNORI, TOKUTARO KIMURA, YUTAKA MINAMI