Abstract: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

Abstract: An interferometer that measures a shape of a surface of an inspection object includes an interference optical system that splits light from a light source into inspection light and reference light and causes the inspection light reflected by the surface of the inspection object and the reference light to interfere with each other, and a photoelectric conversion element that detects interference fringes produced by interference between the inspection light and the reference light. The interference optical system includes a first optical element that transmits and reflects the inspection light, a second optical element that reflects the inspection light, and a moving unit configured to move the second optical element. The inspection light passes through the first optical element, is reflected by the second optical element, is reflected by the first optical element, and is then incident on the surface of the inspection object.

Abstract: To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.

Abstract: An interferometer that measures a shape of a surface of an inspection object includes an interference optical system that splits light from a light source into inspection light and reference light and causes the inspection light reflected by the surface of the inspection object and the reference light to interfere with each other, and a photoelectric conversion element that detects interference fringes produced by interference between the inspection light and the reference light. The interference optical system includes a first optical element that transmits and reflects the inspection light, a second optical element that reflects the inspection light, and a moving unit configured to move the second optical element. The inspection light passes through the first optical element, is reflected by the second optical element, is reflected by the first optical element, and is then incident on the surface of the inspection object.

Abstract: To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original.

Abstract: An exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, a supply pipe for supplying the liquid to the space between a final surface in the projection optical system and the plate, a recovery pipe for recovering the liquid from the space between the final surface in the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid. The measuring apparatus includes (i) a cell for accommodating the liquid and transmitting light, wherein the cell is connected to one of the supply pipe and the recovery pipe, and (ii) a detector for detecting an incident position of the light refracted by the liquid in the cell.

Abstract: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

Abstract: An exposure apparatus includes a projection optical system (3) for projecting a pattern of a mask (2) onto a substrate (5), and a fluid supply unit (6) for supplying a fluid between said projection optical system and the substrate, said fluid supply unit (6) including an injection unit (19) for injecting carbon dioxide into the fluid.

Abstract: An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.

Abstract: An immersion optical system that condenses light from a light source toward a first surface includes a lens having a concave lens surface closest to the first surface, a liquid being filled in a space between the concave lens surface and the first surface, wherein a conditional equation d>L/[2×tan {arcsin(NA/ni)}] is met, where d is a distance between a first point and a second point when the distance becomes maximum between the first point on the concave lens surface and the second point on the first surface in a direction substantially orthogonal to the first surface, L/2 is a maximum distance from the second point to an edge of an irradiation area of the light on a first surface, NA is a numerical aperture of the immersion optical system, and ni is a refractive index of the liquid.

Abstract: An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a plate to be exposed, via a liquid that is filled in a space between the projection optical system and the plate, and a measuring apparatus for measuring a refractive index of the liquid, wherein said measuring apparatus includes a cell for accommodating the liquid and transmitting a light, and a detector for detecting an incident position of the light refracted by the liquid in the cell.

Abstract: An exposure apparatus includes a projection optical system for projecting an image of a pattern of a reticle onto a substrate via liquid, the liquid being filled in a space between an optical element of the projection optical system and the substrate, the optical element being closest to the substrate in the projection optical system, wherein the optical element includes quartz glass that contacts the liquid and is arranged at a side of the substrate, and fluorine-doped quartz glass adhered to the quartz glass.

Abstract: An immersion optical system that condenses light from a light source toward a first surface includes a lens having a concave lens surface closest to the first surface, a liquid being filled in a space between the concave lens surface and the first surface, wherein a conditional equation d>L/[2×tan {arcsin(NA/ni)}] is met, where d is a distance between a first point and a second point when the distance becomes maximum between the first point on the concave lens surface and the second point on the first surface in a direction substantially orthogonal to the first surface, L/2 is a maximum distance from the second point to an edge of an irradiation area of the light on a first surface, NA is a numerical aperture of the immersion optical system, and ni is a refractive index of the liquid.

Abstract: A diffraction-compensated WDM (wavelength division multiplexer) uses TTFs (thin film filters) as concave mirrors. The WDM has a plurality of filter elements for guiding the optical signal along a predetermined optical path, each filter element being transparent to a predetermined wavelength range and including compensating means for at least partially compensating for diffraction of the optical signal. Each filter element has a thin film coated on a substrate, and the compensating means is a curved surface of each thin film. The WDM is more robust than prior art WDM devices using flat TTFs.

Abstract: An exposure apparatus includes a beam splitter for splitting light from a light source into first and second beams, a spatial light modulator, arranged in an optical path for the first beam, for modulating a phase distribution of the first beam, a beam coupler for coupling the first beam with the second beam, a projection optical system for projecting a pattern of the spatial light modulator onto a substrate using light from the beam coupler, and a controller for supplying a modulation signal to the spatial light modulator, wherein the spatial light modulator has a one-dimensionally or two-dimensionally arranged pixels, each pixel has plural reflective elements, and the reflective elements in the same pixel displace in the same direction simultaneously.

Abstract: An exposure apparatus includes a projection optical system (3) for projecting a pattern of a mask (2) onto a substrate (5), and a fluid supply unit (6) for supplying a fluid between said projection optical system and the substrate, said fluid supply unit (6) including an injection unit (19) for injecting carbon dioxide into the fluid.

Abstract: Optical performance monitoring device for monitoring and analyzing an optical signal has a periodically movable reflective mirror to receive an input optical beam and to cyclically “scan” (deflect) the beam in a one-dimensional direction. The deflected beam at a varying deflection angle is directed to a linear variable filter (LVF) that passes a selected wavelength channel of the deflected beam in dependence upon the deflection angle. The selected channel is then passed to a photodetector via a focusing lens, typically a cylindrical lens. The device is durable, tunable, offers low loss, good wavelength registrability and spectral resolution.

Abstract: An optical channel monitoring device uses a linear variable filter (LVF) disposed in the path of a beam of light for selectively transmitting light in a variable manner along a length of the filter, a photodetector array positioned in the path of light transmitted through the LVF for measuring spectral characteristics of the transmitted light, and collimating means disposed between the input port and the LVF for collimating said beam of light. The device is a low-cost, compact and rugged high-resolution spectrometer for various uses.

Abstract: An optical channel monitoring device uses a linear variable filter (LVF) disposed in the path of a beam of light for selectively transmitting light in a variable manner along a length of the filter, a photodetector array positioned in the path of light transmitted through the LVF for measuring spectral characteristics of the transmitted light, and collimating means disposed between the input port and the LVF for collimating said beam of light. The device is a low-cost, compact and rugged high-resolution spectrometer for various uses.

Abstract: Optical performance monitoring device for monitoring and analyzing an optical signal has a periodically movable reflective mirror to receive an input optical beam and to cyclically “scan” (deflect) the beam in a one-dimensional direction. The deflected beam at a varying deflection angle is directed to a linear variable filter (LVF) that passes a selected wavelength channel of the deflected beam in dependence upon the deflection angle. The selected channel is then passed to a photodetector via a focusing lens, typically a cylindrical lens. The device is durable, tunable, offers low loss, good wavelength registrability and spectral resolution.