Abstract: A semiconductor processing system that includes a controller is disclosed. The controller may be configured to schedule the operation of the system. The controller may be programmed to determine a current state of the system. The current state may be defined at least by a location of one or more substrates and a processing status of the one or more substrates. The controller may be further programmed to generate a search tree having one or more branches. Each branch may identify one or more subsequent actions or branch pathways capable of being performed by the system in the current state. Further, the controller may be programmed to score each branch pathway of the generated search tree. The controller may be programmed to select a branch pathway and provide instructions to perform the actions in that branch pathway based at least in part on the score of the branch pathway.

Abstract: A semiconductor processing system that includes a controller is disclosed. The controller may be configured to schedule the operation of the system. The controller may be programmed to determine a current state of the system. The current state may be defined at least by a location of one or more substrates and a processing status of the one or more substrates. The controller may be further programmed to generate a search tree having one or more branches. Each branch may identify one or more subsequent actions or branch pathways capable of being performed by the system in the current state. Further, the controller may be programmed to score each branch pathway of the generated search tree. The controller may be programmed to select a branch pathway and provide instructions to perform the actions in that branch pathway based at least in part on the score of the branch pathway.

Abstract: A single substrate reactor system for processing batches of product substrates one at a time is provided with at least one dummy substrate. In the time after one batch of product substrates is processed and before another batch of product substrates is ready for processing, the dummy substrate is used as a substitute for the thermal load presented by a product substrate. The dummy substrate is loaded into and unloaded from the reactor in the same manner as a batch of product substrates. Advantageously, the thermal load presented by the dummy substrate maintains the thermal equilibrium established during the processing of a batch of product substrates, thereby eliminating the need for and time required to re-establish this equilibrium at the beginning of processing the next batch of substrates.

Abstract: Embodiments of a system, method and computer program product for converting an object are described. In one embodiment, information is obtained from an object that identifies a first version of code associated with the object. Using the obtained information, a minimized class and converter class are identified for converting the object from a first format associated with the first version of code to a second format associated with a second version of the code. The minimized class is utilized to read the object in the first format and the converter class is utilized to convert the read object into the second format.

Abstract: A floating substrate reactor allows heat treatment of a series of semiconductor substrates, one by one. The heat treatment occurs while flowing gas suspends a substrate between two heated surfaces of the reactor. The two heated surfaces each have multiple heating zones. The heating zones are heated to desired temperature(s) and a substrate is then loaded into the reactor for heat treatment. Upon loading, the relatively cold substrate absorbs heat and cools the process chamber. A heat spike, which can be varied, is applied to the heating zones to heat the reactor to the desired temperature again. The substrate, however, is unloaded from the reactor before the temperatures of the heating zones have reached the desired temperature. After the heating zones have reached the desired temperature, the next substrate in the series of substrates is loaded into the reactor for heat treatment.