Patents by Inventor Tomá{hacek over (s)} Vystav{hacek over (e)}l

Tomá{hacek over (s)} Vystav{hacek over (e)}l has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11815479
    Abstract: The invention relates to a method of, and apparatus for, examining a sample using a charged particle beam apparatus. The method as defined herein comprises the step of detecting, using a first detector, emissions of a first type from the sample in response to the charged particle beam illuminating the sample. The method further comprises the step of acquiring spectral information on emissions of a second type from the sample in response to the charged particle beam illuminating the sample. As defined herein, said step of acquiring spectral information comprises the steps of providing a spectral information prediction algorithm and using said algorithm for predicting said spectral information based on detected emissions of the first type as an input parameter of said algorithm. With this it is possible to gather EDS data using only a BSE detector.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: November 14, 2023
    Assignee: FEI Company
    Inventors: Oleksii Kaplenko, Ond{hacek over (r)}ej Machek, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Jan Klusá{hacek over (c)}ek, Kristýna Bukvi{hacek over (s)}ová, Mykola Kaplenko
  • Patent number: 11499926
    Abstract: Methods and systems for conducting tomographic imaging microscopy of a sample with a high energy charged particle beam include irradiating a first region of the sample in a first angular position with a high energy charged particle beam and detecting emissions resultant from the charged particle beam irradiating the first region. The sample is repositioned into a second angular position such that the second region to be different than the first region, and a second region of the sample is irradiated. Example repositioning may include one or more of a translation of the sample, a helical rotation of the sample, the sample being positioned in a non-eucentric position, or a combination thereof. Emissions resultant from irradiation of the second region are then detected, and a 3D model of a portion of the sample is generated based at least in part on the detected first emissions and detected second emissions.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: November 15, 2022
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Zuzana Hlavenková
  • Patent number: 11195693
    Abstract: Dynamic band contrast image (DBCI) is constructed with scattering patterns acquired at multiple scanning locations of a sample using a charged particle beam. Each pixel of the DBCI is generated by integrating the corresponding scattering pattern along a diffraction band. The DBCI includes charged particle channeling condition and can be used for detecting sample defects.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: December 7, 2021
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Pavel Stejskal
  • Patent number: 11017980
    Abstract: The invention relates to a method of manipulating a sample in an evacuated chamber of a charged particle apparatus, the method performed in said evacuated chamber, the method including: providing a sample on a first substrate; bringing an extremal end of a manipulator in contact with the sample; attaching the sample to said extremal end, the attaching being a removable attaching; lifting the sample attached to the extremal end of the manipulator from the first substrate and transport the sample to a second substrate; attaching the sample to the second substrate; and detaching the sample from the extremal end of the manipulator. At least one of the steps of attaching the sample being performed solely by bringing the sample into contact with a bundle of carbon nanotubes.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: May 25, 2021
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Petronella Catharina Maria Baken, Ernst Jan Ruben Vesseur, Pavel Poloucek
  • Patent number: 10846845
    Abstract: Techniques for training an artificial neural network (ANN) using simulated specimen images are described. Simulated specimen images are generated based on data models. The data models describe characteristics of a crystalline material and characteristics of one or more defect types. The data models do not include any image data. Simulated specimen images are input as training data into a training algorithm to generate an artificial neural network (ANN) for identifying defects in crystalline materials. After the ANN is trained, the ANN analyzes captured specimen images to identify defects shown therein.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: November 24, 2020
    Assignee: FEI Company
    Inventors: Ond{hacek over (r)}ej Machek, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Libor Strako{hacek over (s)}, Pavel Potocek
  • Patent number: 10784076
    Abstract: The invention relates to a method 3D defect characterization of crystalline samples in a scanning type electron microscope. The method comprises Irradiating a sample provided on a stage, selecting one set of crystal lattice planes of the sample and orienting said set to a first Bragg condition with respect to a primary electron beam impinging on said sample, and obtaining Electron Channeling Contrast Image for an area of interest on the sample. The method is characterized by performing, at least once, the steps of orienting said selected set of crystal lattice planes to a further Bragg condition by at least tilting the sample stage with the sample by a user-selected angle about a first tilt axis, and obtaining by Electron Channeling Contrast Image for a further area of interest.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: September 22, 2020
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Bohuslav Sed'a, Anna Prokhodtseva
  • Patent number: 10504689
    Abstract: A substrate is alignable for ion beam milling or other inspection or processing by obtaining an electron channeling pattern (ECP) or other electron beam backscatter pattern from the substrate based on electron beam backscatter from the substrate. The ECP is a function of substrate crystal orientation and tilt angles associated with ECP pattern values at or near a maximum, minimum, or midpoint are used to determine substrate tilt. Such tilt is then compensated or eliminated using a tilt stage coupled the substrate, or by adjusting an ion beam axis. In typical examples, circuit substrate “chunks” are aligned for ion beam milling to reveal circuit features for evaluation of circuit processing.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: December 10, 2019
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Libor Strako{hacek over (s)}, Anna Prokhodtseva, Jaromir Va{hacek over (n)}hara, Jaroslav Stárek
  • Patent number: 10170275
    Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: January 1, 2019
    Assignee: FEI Company
    Inventors: John Mitchels, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Martin Cafourek
  • Patent number: 9958403
    Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: May 1, 2018
    Assignee: FEI Company
    Inventors: Pavel Stejskal, Marek Un{hacek over (c)}ovský, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
  • Patent number: 9762863
    Abstract: The invention relates to a method of sampling and displaying information comprising scanning a beam over the sample in a series of N overlapping sub-frames, each comprising Mn scan positions, thereby irradiating the sample at N×Mn scan positions, which form the field of view; detecting a signal, sampled for each scan position, emanating from the sample; and displaying the sub-frames having at least N×Mn pixels in such a way, that after the series of N scans each of the pixels displays information derived from the signal from one or more scan positions; in which after the scan of the first sub-frame each of the pixels displays information derived from the scan positions of the first sub-frame; and after the scan of the second sub-frame each of the pixels displays information derived during the scanning of the first, the second, or both sub-frames.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: September 12, 2017
    Assignee: FEI Company
    Inventors: Pavel Poto{hacek over (c)}ek, Martinus Petrus Maria Bierhoff, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Luká{hacek over (s)} Dryb{hacek over (c)}ák
  • Patent number: 9618463
    Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: April 11, 2017
    Assignee: FEI Company
    Inventors: Marek Un{hacek over (c)}ovský, Pavel Stejskal, Tomá{hacek over (s)} Vystav{hacek over (e)}l