Patents by Inventor Tom Huiskamp

Tom Huiskamp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220184551
    Abstract: A system for exhaust gas remediation includes an engine, a plasma reactor, and a pulse source. The engine emits exhaust gas that includes NO molecules and NOx molecules. The plasma reactor includes an internal chamber that is fluidly connected to the engine such that the exhaust gas flows into the internal chamber. An electrode is disposed within the internal chamber of the plasma reactor. The electrode is electrically coupled to an electrical pulse source. The electrical pulse source delivers electrical pulse to the electrode to form a plasma from the exhaust gas, which removes at least a portion of the NO molecules and at least a portion of the NOx molecules.
    Type: Application
    Filed: March 11, 2020
    Publication date: June 16, 2022
    Applicants: UNIVERSITY OF SOUTHERN CALIFORNIA, TAI CHONG CHEANG STEAMSHIP CO. (H.K.) LIMITED
    Inventors: Stephen B. CRONIN, Sriram SUBRAMANIAN, Tom HUISKAMP, Alec NYSTROM, William SCHROEDER
  • Publication number: 20220152553
    Abstract: This invention relates to methods and systems for reducing the concentration of SOx and/or NOx in gas streams.
    Type: Application
    Filed: March 11, 2020
    Publication date: May 19, 2022
    Applicants: University of Southern California, Tai Chong Cheang Steamship Co. (H.K.) Limited
    Inventors: Stephen B. CRONIN, Alec NYSTROM, Sriram SUBRAMANIAN, Vyaas GURURAJAN, Haotian SHI, Martin A. GUNDERSEN, William SCHROEDER, Sisi YANG, Christi SCHROEDER, Fokion EGOLFOPOULOS, Tom HUISKAMP
  • Patent number: 9161427
    Abstract: Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: October 13, 2015
    Assignee: Vision Dynamics Holding B.V.
    Inventors: Paulus Petrus Maria Blom, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Hugo Anton Marie De Haan, Antonius Hubertus Van Schijndel, Edwin Te Sligte, Nicolaas Cornelis Josephus Van Hijningen, Tom Huiskamp
  • Publication number: 20130206720
    Abstract: Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
    Type: Application
    Filed: February 17, 2010
    Publication date: August 15, 2013
    Applicant: VISION DYNAMICS HOLDING B.V.
    Inventors: Paulus Petrus Maria Blom, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Hugo Anton Marie De Haan, Antonius Hubertus Van Schijndel, Edwin Te Sligte, Nicolaas Cornelis Josephus Van Hijningen, Tom Huiskamp