Patents by Inventor Tom K. CHOI

Tom K. CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and methods for reducing particles in semiconductor process chambers
    Patent number: 10770269
    Abstract: Embodiments of the present disclosure generally provide various apparatus and methods for reducing particles in a semiconductor processing chamber. One embodiment of present disclosure provides a vacuum screen assembly disposed over a vacuum port to prevent particles generated by the vacuum pump from entering substrate processing regions. Another embodiment of the present disclosure provides a perforated chamber liner around a processing region of the substrate. Another embodiment of the present disclosure provides a gas distributing chamber liner for distributing a cleaning gas around the substrate support under the substrate supporting surface.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: September 8, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Andrew Nguyen, Bradley Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Choi, Kenneth S. Collins, Anand Kumar, Michael D. Willwerth, Yogananda Sarode Vishwanath
  • APPARATUS AND METHODS FOR REDUCING PARTICLES IN SEMICONDUCTOR PROCESS CHAMBERS
    Publication number: 20170345623
    Abstract: Embodiments of the present disclosure generally provide various apparatus and methods for reducing particles in a semiconductor processing chamber. One embodiment of present disclosure provides a vacuum screen assembly disposed over a vacuum port to prevent particles generated by the vacuum pump from entering substrate processing regions. Another embodiment of the present disclosure provides a perforated chamber liner around a processing region of the substrate. Another embodiment of the present disclosure provides a gas distributing chamber liner for distributing a cleaning gas around the substrate support under the substrate supporting surface.
    Type: Application
    Filed: August 15, 2017
    Publication date: November 30, 2017
    Inventors: Andrew NGUYEN, Bradley HOWARD, Shahid RAUF, Ajit BALAKRISHNA, Tom K. CHOI, Kenneth S. COLLINS, Anand KUMAR, Michael D. WILLWERTH, Yogananda SARODE VISHWANATH