Patents by Inventor Tom Kirschenheiter

Tom Kirschenheiter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REACTOR SYSTEM AND METHOD TO REDUCE RESIDUE BUILDUP DURING A FILM DEPOSITION PROCESS
    Publication number: 20220307139
    Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.
    Type: Application
    Filed: June 15, 2022
    Publication date: September 29, 2022
    Inventors: Hyeongeu Kim, Tom Kirschenheiter, Eric Hill, Mark Hawkins, Loren Jacobs
  • Reactor system and method to reduce residue buildup during a film deposition process
    Patent number: 11390950
    Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: July 19, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: Hyeongeu Kim, Tom Kirschenheiter, Eric Hill, Mark Hawkins, Loren Jacobs
  • Gas distribution system, reactor including the system, and methods of using the same
    Patent number: 10604847
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: March 31, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • GAS DISTRIBUTION SYSTEM, REACTOR INCLUDING THE SYSTEM, AND METHODS OF USING THE SAME
    Publication number: 20190106788
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Application
    Filed: December 7, 2018
    Publication date: April 11, 2019
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • Gas distribution system, reactor including the system, and methods of using the same
    Patent number: 10167557
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: January 1, 2019
    Assignee: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • REACTOR SYSTEM AND METHOD TO REDUCE RESIDUE BUILDUP DURING A FILM DEPOSITION PROCESS
    Publication number: 20180195174
    Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.
    Type: Application
    Filed: January 10, 2017
    Publication date: July 12, 2018
    Inventors: Hyeongeu Kim, Tom Kirschenheiter, Eric Hill, Mark Hawkins, Loren Jacobs
  • GAS DISTRIBUTION SYSTEM, REACTOR INCLUDING THE SYSTEM, AND METHODS OF USING THE SAME
    Publication number: 20150267299
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 24, 2015
    Applicant: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys