Patents by Inventor Tom Lada

Tom Lada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ENHANCED EUV MATERIALS, PHOTORESISTS AND METHODS OF THEIR USE.
    Publication number: 20260029711
    Abstract: The current application discloses novel zwitterion materials which provide unexpected results useful in photolithographic resist compositions. In particular the compounds and photoresists made therefrom provide improvements in EUV photo defined line geometries as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.
    Type: Application
    Filed: June 24, 2023
    Publication date: January 29, 2026
    Applicant: Irresistible Materials LTD
    Inventors: Alex P. G. Robinson, Ed Jackson, Gregory O'Callaghan, John Roth, Alexandra McClelland, Tom Lada, Carmen Popescu
  • ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
    Publication number: 20250383601
    Abstract: The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.
    Type: Application
    Filed: May 22, 2023
    Publication date: December 18, 2025
    Applicant: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Alexandra McClelland, Fernanda Meloni, Van Huy Nguyen, Gregory O'Callaghan, Edward Jackson, John Roth, Tim McCoy, Tom Lada
  • Enhanced EUV photoresist materials, formulations and processes
    Patent number: 11681227
    Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: June 20, 2023
    Inventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
  • Enhanced EUV Photoresist Materials, Formulations and Processes
    Publication number: 20200272050
    Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 27, 2020
    Applicant: IRRESISTIBLE MATERIALS, LTD
    Inventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
  • Spin on hard mask material
    Patent number: 10290500
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: May 14, 2019
    Assignee: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andeas Frommhold, Alan Brown, Tom Lada
  • Spin On Hard Mask Material
    Publication number: 20170278703
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Application
    Filed: December 4, 2015
    Publication date: September 28, 2017
    Applicant: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andeas Frommhold, Alan Brown, Tom Lada