Patents by Inventor Tom Miller
Tom Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20130256553Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.Type: ApplicationFiled: March 31, 2012Publication date: October 3, 2013Applicant: FEI CompanyInventors: Tom Miller, Sean Kellogg, Jiri Zbranek
-
Publication number: 20130151273Abstract: Providers may use mobile devices to access mobile drug sampling services from a drug sample promotional ecosystem. The drug sample promotional ecosystem includes a promotional orchestration engine which comprises a services engine that provides transactional responses to a provider's request, such as informational results being returned to the provider or request for further actions that will be forwarded. An analysis engine stores data and provides tactical and strategic level analysis. The learning engine is a mechanism by which the promotional orchestration engine adapts itself to changing conditions. The learning engine preferably customizes various components of the services engine and components of the analysis engine. From a provider's standpoint, the learning engine allows components of the services engine to be personalized to the particular provider.Type: ApplicationFiled: June 8, 2012Publication date: June 13, 2013Applicant: SKYSCAPE, INC.Inventors: Jeff Jones, Tom Miller, Tom Quinn, Kartik Shah
-
Patent number: 8445870Abstract: A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.Type: GrantFiled: December 28, 2011Date of Patent: May 21, 2013Assignee: FEI CompanyInventors: Shouyin Zhang, Tom Miller, Sean Kellog, Anthony Graupera
-
Publication number: 20130098871Abstract: An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.Type: ApplicationFiled: October 19, 2011Publication date: April 25, 2013Applicant: FEI CompanyInventors: Tom Miller, Shouyin Zhang
-
Publication number: 20120324517Abstract: A set top/back box and system and method for providing a remote control device are disclosed. In one embodiment, one or more wireless transceivers are located within a housing, which also interconnectively includes television input/output, a processor, and memory. The set top/back box may establish a pairing with a programmable device, such as a proximate wireless-enabled interactive handheld device having a touch screen display, whereby formatted parallel audiovisual experience instructions, including virtual buttons, may be transmitted to the programmable device for display on the touch screen display to create a experience parallel to the experience on the television. The set top/back box receives and processes virtual remote control functionality input instructions from the programmable device to control amenities associated with the set top/back box.Type: ApplicationFiled: June 20, 2012Publication date: December 20, 2012Inventors: Vanessa Ogle, Bill Fang, Tom Miller, David Straitiff, Scott Horton
-
Patent number: 8314409Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.Type: GrantFiled: August 28, 2010Date of Patent: November 20, 2012Assignee: FEI CompanyInventors: Tom Miller, Gene Mirro, Cornelis Sander Kooijman, Hendrik Jan de Vos
-
Publication number: 20120232925Abstract: A facility fulfills drug samples to prescribers in several different manners. A prescriber can request drug samples through an electronic medical record application, an electronic prescribing application, or a mobile application, which are sent to or printed for patients who in turn go to a pharmacy to obtain the free medications.Type: ApplicationFiled: November 11, 2011Publication date: September 13, 2012Applicant: Skyscape.com, Inc.Inventors: Tom Quinn, Tom Miller, Cecil Kost, Sanjay Pingle
-
Publication number: 20120217152Abstract: A method for rapid switching between operating modes with differing beam currents in a charged particle system is disclosed. Many FIB milling applications require precise positioning of a milled pattern within a region of interest (RoI). This may be accomplished by using fiducial marks near the RoI, wherein the FIB is periodically deflected to image these marks during FIB milling. Any drift of the beam relative to the RoI can then be measured and compensated for, enabling more precise positioning of the FIB milling beam. It is often advantageous to use a lower current FIB for imaging since this may enable higher spatial resolution in the image of the marks. For faster FIB milling, a larger beam current is desired. Thus, for optimization of the FIB milling process, a method for rapidly switching between high and low current operating modes is desirable.Type: ApplicationFiled: February 27, 2012Publication date: August 30, 2012Applicant: FEI CompanyInventor: Tom Miller
-
Patent number: 8253118Abstract: A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.Type: GrantFiled: October 14, 2009Date of Patent: August 28, 2012Assignee: FEI CompanyInventors: Shouyin Zhang, Tom Miller, Sean Kellogg, Anthony Graupera
-
Patent number: 8183547Abstract: A dual beam system provides for operation of a focused ion beam in the presence of a magnetic field from an ultra-high resolution electron lens. The ion beam is deflected to compensate for the presence of the magnetic field.Type: GrantFiled: May 27, 2010Date of Patent: May 22, 2012Assignee: FEI CompanyInventor: Tom Miller
-
Publication number: 20120091360Abstract: A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.Type: ApplicationFiled: December 28, 2011Publication date: April 19, 2012Applicant: FEI COMPANYInventors: Shouyin Zhang, Tom Miller, Sean Kellogg, Anthony Graupera
-
Publication number: 20120078071Abstract: Systems and methods for processing, transmitting, and displaying data received from a continuous analyte (e.g., glucose) sensor are provided. A sensor system can comprise a sensor electronics module that includes power saving features, e.g., a low power measurement circuit that can be switched between a measurement mode and a low power mode, wherein charging circuitry continues to apply power to electrodes of a sensor during the low power mode. The sensor electronics module can be switched between a low power storage mode and a higher power operational mode via a switch, e.g., a reed switch or optical switch. A validation routine can be implemented to ensure an interrupt signal sent from the switch is valid. The sensor can be physically connected to the sensor electronics module in direct wireless communication with a plurality of different display devices.Type: ApplicationFiled: September 28, 2011Publication date: March 29, 2012Applicant: DexCom, Inc.Inventors: Sebastian Bohm, Mark Dervaes, Eric Johnson, Apurv Ullas Kamath, Shawn Larvenz, Jacob S. Leach, Phong Lieu, Aarthi Mahalingam, Tom Miller, Paul V. Neale, Jack Pryor, Thomas A. Peyser, Daiting Rong, Kenneth San Vicente, Mohammad Ali Shariati, Peter C. Simpson, Matthew Wightlin
-
Patent number: 8124942Abstract: A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.Type: GrantFiled: February 23, 2010Date of Patent: February 28, 2012Assignee: FEI CompanyInventors: Anthony Graupera, Sean Kellogg, Tom Miller, Dustin Laur, Shouyin Zhang, Antonius Bastianus Wilhelmus Dirriwachter
-
Publication number: 20120032092Abstract: A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.Type: ApplicationFiled: October 19, 2011Publication date: February 9, 2012Applicant: FEI COMPANYInventors: Anthony Graupera, Sean Kellogg, Tom Miller, Dustin Laur, Shouyin Zhang, Antonius Bastianus Wilhelmus Dirriwachter
-
Publication number: 20110321105Abstract: A system and method are disclosed for alternate multi-channel bi-directional data transmission in a multi-unit environment. In one embodiment, legacy infrastructure connects entertainment centers in respective rooms to a service server to provide downstream communication from the service server to the entertainment center. To provide bi-directional data transmission, an upstream data transmission channel is provided which includes multiple transmission mediums from the entertainment centers to the service center. The resulting bi-directional channel is asymmetrical with respect to bandwidth and the upstream communication link includes non-continuous bandwidth links.Type: ApplicationFiled: June 24, 2011Publication date: December 29, 2011Inventors: Vanessa Ogle, Bill Fang, Tom Miller, Jeff Johns
-
Publication number: 20110198511Abstract: A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.Type: ApplicationFiled: February 23, 2010Publication date: August 18, 2011Applicant: FEI COMPANYInventors: ANTHONY GRAUPERA, Sean Kellogg, Tom Miller, Dustin Laur, Shouyin Zhang
-
Publication number: 20110163068Abstract: A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.Type: ApplicationFiled: January 9, 2009Publication date: July 7, 2011Inventors: Mark Utlaut, Noel Smith, Paul P. Tesch, Tom Miller, David H. Narum, David Tuggle, Lawrence Scipioni
-
Patent number: 7949998Abstract: Mechanisms are disclosed that allow for platform abstraction of a computing platform using a programming framework. The programming framework allows application programs to interact with different platforms in an identical manner by abstracting the platform. The application uses identical instructions to the programming framework across different platforms, with the programming framework modifying the instructions to fit platform specific requirements. The programming framework also emulates platform specific expected application behavior on behalf of the application. The programming framework may also provide an additional layer of security for the platform, limiting the access of the application program.Type: GrantFiled: April 20, 2007Date of Patent: May 24, 2011Assignee: Microsoft CorporationInventors: Paul L. Bleisch, Shawn Hargreaves, Tom Miller, Matthew Orren Picioccio, John M. Walker
-
Publication number: 20110084207Abstract: A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.Type: ApplicationFiled: October 14, 2009Publication date: April 14, 2011Applicant: FEI COMPANYInventors: Shouyin Zhang, Tom Miller, Sean Kellogg, Anthony Graupera
-
Publication number: 20110049382Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.Type: ApplicationFiled: August 28, 2010Publication date: March 3, 2011Applicant: FEI COMPANYInventors: Tom Miller, Gene Mirro, Cornelis Sander Kooijman, Hendrik Jan De Vos