Abstract: A system for presenting help information relating to a user of a computer program based on context of the computer program is provided. The system receives an indication of a generic request and identifies the context of the computer program at the time of the request. The context may include information that is currently being displayed by the computer program and metadata relating to the user and the computer program. The system selects help information based on the context such that the selected help information varies based on information that is currently being displayed and the metadata. The system then presents the help information to the user.

Abstract: A system for presenting help information relating to a user of a computer program based on context of the computer program is provided. The system receives an indication of a generic request and identifies the context of the computer program at the time of the request. The context may include information that is currently being displayed by the computer program and metadata relating to the user and the computer program. The system selects help information based on the context such that the selected help information varies based on information that is currently being displayed and the metadata, The system then presents the help information to the user.

Abstract: A method of monitoring and adjusting the position of a wafer with respect to an ion beam including setting the position of a wafer holder so that a wafer to be held therein is positioned at a tilt angle of 45 degrees and a twist angle of 45 degrees with respect to the path of an ion beam; positioning a n-type wafer without screen oxide in the wafer holder; implanting boron species into a region of the wafer at 160 KeV and a dose level of 5.0×1013 atoms/cm2; periodically measuring the sheet resistivity of a implanted wafer and readjusting the wafer tilt angle when the sheet resistivity is greater than 30 ohms/square.

Abstract: A method of monitoring and adjusting the position of a wafer with respect to an ion beam including setting the position of a wafer holder so that a wafer to be held therein is positioned at a tilt angle of 45 degrees and a twist angle of 45 degrees with respect to the path of an ion beam; positioning a n-type wafer without screen oxide in the wafer holder; implanting boron species into a region of the wafer at 160 KeV and a dose level of 5.0×1013 atoms/cm2; periodically measuring the sheet resistivity of a implanted wafer and readjusting the wafer tilt angle when the sheet resistivity is greater than 30 ohms/square.

Abstract: A moisture-controlled wafer storage container for storing semiconductor wafers during processing and a method for using the container are provided. The container may be constructed of a container body that has a front wall, a back wall, a left-side wall, a right-side wall and a top wall defining a cavity therein for receiving a wafer cassette and wafers stored in the cassette. The cavity is further defined by a bottom wall of a wafer cassette when the cassette is positioned in the container to form a sealed cavity. The container further includes a moisture-absorbing means that is placed in the container or in fluid communication with the sealed cavity of the container for absorbing moisture and for controlling a relative humidity in the sealed cavity to less than 30%, and preferably to less than 20%, and more preferably to less than 10%.