Patents by Inventor Tomas Vystavel

Tomas Vystavel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9837246
    Abstract: A lamella for observation on a transmission electron microscope and other analytical instruments includes multiple thin regions separated by thicker regions or ribs. In some embodiments, the lamella can be wider than 50 ?m with more than 10 multiple thin regions, with each thin region may being as thin as 10 nm or even thinner. The process for making such lamellae lends itself to automation. The process is fault tolerant in that not all of the multiple thin regions need to be useable as long as one region provides a useful image. Redeposition is reduced because ion beam imaging is reduced in the automated process and because the ribs reduce redeposition between regions.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: December 5, 2017
    Assignee: FEI Company
    Inventors: Remco Theodorus Johannes Petrus Geurts, Tomas Vystavel
  • Patent number: 9741527
    Abstract: A specimen holder for a Charged Particle Microscope is disclosed. The holder has a support structure with an elongated member including a specimen mounting zone. The specimen mounting zone comprises a rotor with an axis perpendicular to the elongated member with a paddle connected to it which may be rotated. Specimens may be mounted on the paddle so that rotation of the paddle allows specimens to be rotated and/or inverted for microscopic observation on both sides. Specimens may either be directly mounted on the paddle, or on a grid, half-moon grid, lift-out grid, aperture frame, dielectric film, etc.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: August 22, 2017
    Assignee: FEI Company
    Inventors: Tomas Vystavel, Josef Sestak, Pavel Poloucek, Lubomir Tuma, Michal Hrouzek, Tomas Trnkocy, Martin Cafourek
  • Publication number: 20160307727
    Abstract: The invention relates to a method of manipulating a sample in an evacuated chamber of a charged particle apparatus, the method performed in said evacuated chamber, the method including: providing a sample on a first substrate; bringing an extremal end of a manipulator in contact with the sample; attaching the sample to said extremal end, the attaching being a removable attaching; lifting the sample attached to the extremal end of the manipulator from the first substrate and transport the sample to a second substrate; attaching the sample to the second substrate; and detaching the sample from the extremal end of the manipulator. At least one of the steps of attaching the sample being performed solely by bringing the sample into contact with a bundle of carbon nanotubes.
    Type: Application
    Filed: April 14, 2016
    Publication date: October 20, 2016
    Applicant: FEI Company
    Inventors: Tomás Vystavel, Petronella Catharina Maria Baken, Ernst Jan Ruben Vesseur, Pavel Poloucek
  • Publication number: 20160199878
    Abstract: A method of modifying a sample surface layer in the vacuum chamber of a particle-optical apparatus, the method performed in vacuum, the method comprising: Providing the microscopic sample attached to a manipulator, Providing a first liquid at a first (controlled) temperature, Dipping the sample in the first liquid, thereby causing a sample surface modification, Removing the sample from the first liquid, Providing a second liquid at a second (controlled) temperature, Dipping the sample in the second liquid, and Removing the sample from the second liquid. This enables the wet processing of a sample in-situ, thereby enhancing speed and/or avoiding subsequent alteration/contamination of the sample, such as oxidation, etc. The method is particularly useful for etching a lamella after machining the lamella with a (gallium) FIB to remove the surface layer where gallium implantation occurred, or where the crystal lattice is disturbed.
    Type: Application
    Filed: January 11, 2016
    Publication date: July 14, 2016
    Applicant: FEI Company
    Inventors: Tomas Vystavel, Aurelien Philippe Jean Maclou Botman
  • Publication number: 20160181059
    Abstract: A specimen holder for a Charged Particle Microscope, comprising: A support structure; An elongated member, a first end of which is connected to said support structure and the second end of which comprises a specimen mounting zone, the member having a longitudinal axis that extends along its length between said first and second ends, wherein said specimen mounting zone comprises: A rotor that is rotatable about a transverse axis extending substantially perpendicular to said longitudinal axis; A paddle connected to said rotor so as to be rotatable about said transverse axis, the paddle comprising a specimen mounting area; Driving means connected to said rotor, which can be invoked to rotate said paddle through a rotational range that allows the paddle to be inverted relative to an initial orientation thereof.
    Type: Application
    Filed: December 21, 2015
    Publication date: June 23, 2016
    Applicant: FEI Company
    Inventors: Tomas Vystavel, Josef Sestak, Pavel Poloucek, Lubomir Tuma, Michal Hrouzek, Tomas Trnkocy, Martin Cafourek
  • Publication number: 20160054240
    Abstract: The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.
    Type: Application
    Filed: August 24, 2015
    Publication date: February 25, 2016
    Applicant: FEI Company
    Inventors: Marek Uncovský, Pavel Stejskal, Tomás Vystavel
  • Publication number: 20140146160
    Abstract: The invention relates to a method of sampling and displaying information comprising scanning a beam over the sample in a series of N overlapping sub-frames, each comprising Mn scan positions, thereby irradiating the sample at N×Mn scan positions, which form the field of view; detecting a signal, sampled for each scan position, emanating from the sample; and displaying the sub-frames having at least N×Mn pixels in such a way, that after the series of N scans each of the pixels displays information derived from the signal from one or more scan positions; in which after the scan of the first sub-frame each of the pixels displays information derived from the scan positions of the first sub-frame; and after the scan of the second sub-frame each of the pixels displays information derived during the scanning of the first, the second, or both sub-frames.
    Type: Application
    Filed: November 26, 2013
    Publication date: May 29, 2014
    Applicant: FEI Company
    Inventors: Pavel Potocek, Martinus Petrus Maria Bierhoff, Tomás Vystavël, Lukás Drybcák