Abstract: Methods of and apparatuses for monitoring a plating bath composition by using voltammetric consolidated designer waveforms. The designer AC waveforms are optimized and consolidated to maximize analytical output of the solitary measurement thus drastically reducing the total time required for a full analysis of a plating bath as compared to traditional analytical techniques. More specifically, the present invention relates to a novel concept of generating of a consolidated designer waveform from the preselected segments of designer AC waveforms. More particularly, the method of present invention relates to determination of segments of designer AC waveforms based on a novel chemometric parameter of Analysis of Variance relative F-ratio.

Abstract: Methods of and apparatuses for monitoring a plating bath composition by using complex designer voltammetry. The designer waveforms are optimized in order to maximize analytical output of the solitary measurement thus drastically reducing the total time required for a full analysis of a plating bath compared to traditional analytical techniques.