Patents by Inventor Tomihiko Kawamura

Tomihiko Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4802985
    Abstract: A porous water-treating material comprising cut porous strads each comprising a resinous matrix material which consists essentially of a thermoplastic polymer material or a mixture thereof with an inorganic particulate material. Each strand having a number of pores connected to each other and an irregularly rugged peripheral surface which has a ratio in diameter of a circumscribed circle to an inscribed circle in any cross-sectional profile from 1.10:1 to 5.00:1 and a ratio of the distance between circumscribed lines to that between inscribed lines in any side projection profile of from 1.10:1 to 3.00:1. The cut porous strands are prepared by melt-extruding a resinous mixture of the resinous matrix material with a blowing agent at a temperature higher than the melting point of the thermoplastic polymer material and the thermally decomposing point of the blowing material so as to cause the strands to have a number of pores and an irregularly rugged peripheral surface thereof.
    Type: Grant
    Filed: May 1, 1987
    Date of Patent: February 7, 1989
    Assignee: Mitsubishi Rayon Company Ltd.
    Inventors: Shuighi Sugimori, Tomihiko Kawamura
  • Patent number: 4801386
    Abstract: A porous water-treating material comprising cut porous strands each comprising a resinous matrix material which consists essentially of a thermoplastic polymer material or a mixture thereof with an inorganic particulate material. Each strand having a number of pores connected to each other and an irregularly rugged peripheral surface which has a ratio in diameter of a circumscribed circle to an inscribed circle in any cross-sectional profile from 1.10:1 to 5.00:1 and a ratio of the distance between circumscribed lines to that between inscribed lines in any side projection profile of from 1.10:1 to 3.00:1. The cut porous strands are prepared by melt-extruding a resinous mixture of the resinous matrix material with a blowing agent at a temperature higher than the melting point of the thermoplastic polymer material and the thermally decomposing point of the blowing material so as to cause the strands to have a number of pores and an irregularly rugged peripheral surface thereof.
    Type: Grant
    Filed: April 13, 1988
    Date of Patent: January 31, 1989
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Shuichi Sugimori, Tomihiko Kawamura, Tadashi Matsuda, Shintaro Nakano, deceased, Sumito Saiki, Hideaki Habara
  • Patent number: 4407895
    Abstract: Photo, electron beam and x-ray sensitive resins are comprised of a 2-alkylglycidyl methacrylate homopolymer or a copolymer containing at least 50 mol % of alkylglycidyl methacrylate. The resins have excellent resolving power and sensitivity and are useful for negative type resists.
    Type: Grant
    Filed: January 25, 1982
    Date of Patent: October 4, 1983
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Jun Nakauchi, Tomihiko Kawamura