Patents by Inventor Tomiho Yamada

Tomiho Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7884020
    Abstract: A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: February 8, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideaki Hirabayashi, Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada
  • Patent number: 7820274
    Abstract: A prepreg having low dielectric constant, low dielectric loss, and high heat cycle resistance. The prepreg includes a sheet-like preform and a resin-impregnated, sheet-like, fiber-reinforced material thermal pressure adhered to the sheet-like preform. The sheet-like preform includes a graft copolymer (a) in which 15 to 40 parts by mass of an aromatic vinyl monomer are grafted to 60 to 85 parts by mass of a random or block copolymer comprising monomer units selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers. The resin-impregnated, sheet-like, fiber-reinforced material includes a sheet-like, fiber-reinforced material (b1) and a thermoplastic resin (b2) into which the sheet-like, fiber-reinforced material (b1) is impregnated. The thermoplastic resin (b2) is a random or block copolymer composed of 60 to 90 mass % of a monomer unit, which is selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers, and 10 to 40 mass % of an aromatic vinyl monomer unit.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: October 26, 2010
    Assignee: NOF Corporation
    Inventors: Toshihiro Ohta, Tomiho Yamada, Shigeru Asami
  • Publication number: 20080032504
    Abstract: A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.
    Type: Application
    Filed: September 28, 2007
    Publication date: February 7, 2008
    Inventors: Hideaki HIRABAYASHI, Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada
  • Publication number: 20070281566
    Abstract: A prepreg having low dielectric constant, low dielectric loss, and high heat cycle resistance. The prepreg includes a sheet-like preform and a resin-impregnated, sheet-like, fiber-reinforced material thermal pressure adhered to the sheet-like preform. The sheet-like preform includes a graft copolymer (a) in which 15 to 40 parts by mass of an aromatic vinyl monomer are grafted to 60 to 85 parts by mass of a random or block copolymer comprising monomer units selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers. The resin-impregnated, sheet-like, fiber-reinforced material includes a sheet-like, fiber-reinforced material (b1) and a thermoplastic resin (b2) into which the sheet-like, fiber-reinforced material (b1) is impregnated. The thermoplastic resin (b2) is a random or block copolymer composed of 60 to 90 mass % of a monomer unit, which is selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers, and 10 to 40 mass % of an aromatic vinyl monomer unit.
    Type: Application
    Filed: May 30, 2007
    Publication date: December 6, 2007
    Applicants: NOF CORPORATION, TDK CORPORATION
    Inventors: Toshihiro Ohta, Tomiho Yamada, Shigeru Asami
  • Publication number: 20070281142
    Abstract: A resin composition suitable for manufacturing an electrical insulative resin film for a printed wiring board is composed of 80 to 99.5 mass % of a first graft copolymer (a) and 0.5 to 20 mass % of a second graft copolymer (b). In the first graft copolymer (a), 15 to 40 parts by mass of an aromatic vinyl monomer are grafted to 60 to 85 parts by mass of a random or block copolymer composed of monomer units selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers. In the second graft copolymer (b), 5 to 30 parts by mass of an aromatic vinyl monomer are grafted to 70 to 95 parts by mass of a random or block copolymer composed of 60 to 90 mass % of a monomer unit, which is selected from nonpolar ?-olefin monomers and nonpolar conjugated diene monomers, and 10 to 40 mass % of an aromatic vinyl monomer unit.
    Type: Application
    Filed: May 30, 2007
    Publication date: December 6, 2007
    Applicant: NOF CORPORATION
    Inventors: Toshihiro Ohta, Kensaku Sonoda, Tomiho Yamada
  • Patent number: 7291188
    Abstract: A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.
    Type: Grant
    Filed: November 23, 2004
    Date of Patent: November 6, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideaki Hirabayashi, Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada
  • Publication number: 20050148185
    Abstract: A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.
    Type: Application
    Filed: November 23, 2004
    Publication date: July 7, 2005
    Inventors: Hideaki Hirabayashi, Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada
  • Patent number: 6420476
    Abstract: The invention has for its object to provide a composite dielectric material having any desired dielectric constant selectable from a relatively wide range in a high-frequency band and a low dielectric loss tangent, and a film, substrate, electronic part or molded or otherwise formed article using the same. To accomplish this object, there is provided a composite dielectric material composition comprising a heat-resistant, low-dielectric polymeric material that is a resin composition comprising one or two or more resins having a weight-average absolute molecular weight of at least 1,000, wherein the sum of carbon atoms and hydrogen atoms in said composition is at least 99%, and some or all resin molecules have a chemical bond therebetween, and a filler. A film, substrate, electronic part or molded or otherwise formed article is obtained using this composition.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: July 16, 2002
    Assignees: TDK Corporation, NOF Corporation
    Inventors: Toshiaki Yamada, Hiroaki Hasegawa, Yoshiyuki Yasukawa, Kenji Endou, Michihisa Yamada, Yasuo Moriya, Tomiho Yamada, Tetsuya Itoh