Patents by Inventor Tominori NAKAMURA

Tominori NAKAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220371130
    Abstract: This laser processing apparatus is for forming modified regions in an object, which includes a sapphire substrate having a C-plane as a main surface, along cutting lines by focusing laser light on the object, and is provided with a laser light source, a spatial light modulator, and a focusing optical system. The spatial light modulator performs aberration correction by a first aberration correction amount smaller than an ideal aberration correction amount when the modified region is formed along a first cutting line along an a-axis direction of the sapphire substrate, and performs aberration correction by a second aberration correction amount smaller than the ideal aberration correction amount and different from the first aberration correction amount when the modified region is formed along a second cutting line along an in-axis direction of the sapphire substrate.
    Type: Application
    Filed: August 7, 2020
    Publication date: November 24, 2022
    Applicants: NICHIA CORPORATION, HAMAMATSU PHOTONICS K.K.
    Inventors: Hiroaki TAMEMOTO, Minoru YAMAMOTO, Yusuke SEKIMOTO, Ryota SUGIO, Tominori NAKAMURA