Patents by Inventor Tominori Yoshida

Tominori Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for forming thin film using surface-treated shower plate
    Patent number: 7641761
    Abstract: A plasma CVD apparatus includes a showerhead comprised of a body having a hollow structure. The shower plate is detachably integrated with the body at a peripheral surface of the body and a peripheral surface of the shower plate, and at least one of the peripheral surface of the body or the peripheral surface of the shower plate is surface-treated.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: January 5, 2010
    Assignee: ASM Japan K.K.
    Inventors: Naoto Tsuji, Yukihiro Mori, Tominori Yoshida, Masami Suzuki
  • Apparatus and method for forming thin film using surface-treated shower plate
    Publication number: 20050156063
    Abstract: A plasma CVD apparatus includes a showerhead comprised of a body having a hollow structure. The shower plate is detachably integrated with the body at a peripheral surface of the body and a peripheral surface of the shower plate, and at least one of the peripheral surface of the body or the peripheral surface of the shower plate is surface-treated.
    Type: Application
    Filed: January 20, 2005
    Publication date: July 21, 2005
    Applicant: ASM JAPAN K.K.
    Inventors: Naoto Tsuji, Yukihiro Mori, Tominori Yoshida, Masami Suzuki
  • Low-k dielectric materials and processes
    Patent number: 6905981
    Abstract: Improved dielectric materials suitable for use in integrated circuits and computer systems are provided by a chemical vapor deposition process employing fluoroalkane precursors.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: June 14, 2005
    Assignee: ASM Japan K.K.
    Inventors: Michael A. Todd, Tominori Yoshida