Patents by Inventor Tomio Nagatsuka

Tomio Nagatsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RADIATION-SENSITIVE RESIN COMPOSITION AND COLOR FILTERS
    Publication number: 20090269683
    Abstract: A radiation sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a radiation sensitive radical generator, wherein the alkali-soluble resin (B) is a resin having a group containing a dithiocarbonyl bond at least one terminal of its polymer chain. A color filter which is free from burning can be manufactured from this composition at a high yield.
    Type: Application
    Filed: September 7, 2006
    Publication date: October 29, 2009
    Applicant: JSR CORPORATION
    Inventors: Tatsuyoshi Kawamoto, Tsukasa Toyoshima, Masashi Arai, Ryu Matsumoto, Tomio Nagatsuka, Toshihiro Tadaki
  • Radiation sensitive composition
    Patent number: 6255034
    Abstract: A radiation sensitive composition contains (A) a colorant, (B) a binder polymer, (C) a polyfunctional monomer and (D) a carboxyl group-containing monofunctional monomer, an amide group-containing monoethylenically unsaturated monomer, a monoethylenically unsaturated monomer having a cyclic amide group or cyclic imide group or a phenyl group-containing (meth)acrylate, and (E) a photopolymerization initiator. The composition is useful for producing a color filter for use in color liquid crystal display device, color image pick-up elements etc.
    Type: Grant
    Filed: September 8, 1998
    Date of Patent: July 3, 2001
    Assignee: JSR Corporation
    Inventors: Satoshi Shimada, Tomio Nagatsuka, Hiroaki Nemoto, Atsushi Kumano