Patents by Inventor Tomio Nakayama

Tomio Nakayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus and method
    Patent number: 7140321
    Abstract: A plasma processing apparatus includes a vacuum chamber that accommodates an object to be processed, and provides a plasma process to the object in a vacuum or reduced pressure environment, a dielectric for transmitting microwaves to the vacuum chamber and for maintaining the vacuum or reduced environment of the vacuum chamber, a plate that has slots for guiding the microwaves to the dielectric, and a temperature control mechanism that has a cooling channel between the plate and the dielectric, and controls temperature of the dielectric.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: November 28, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tomio Nakayama, Hirohisa Oda, Hitoshi Ishihama, Kazumichi Kuramochi, Junya Takahashi
  • Plasma processing apparatus and method
    Publication number: 20040118520
    Abstract: A plasma processing apparatus includes a vacuum chamber that accommodates an object to be processed, and provides a plasma process to the object in a vacuum or reduced pressure environment, a dielectric for transmitting microwaves to the vacuum chamber and for maintaining the vacuum or reduced environment of the vacuum chamber, a plate that has slots for guiding the microwaves to the dielectric, and a temperature control mechanism that has a cooling channel between the plate and the dielectric, and controls temperature of the dielectric.
    Type: Application
    Filed: December 3, 2003
    Publication date: June 24, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventors: Tomio Nakayama, Hirohisa Oda, Hitoshi Ishihama, Kazumichi Kuramochi, Junya Takahashi