Abstract: A device for drying and polishing items such as glasses and cutlery, the device including an enclosure having apertures through which an end of the items can be inserted; a plurality of movable cleaning elements within the enclosure for drying and/or polishing the items; and a selectively operable steam distribution system for applying steam within the enclosure to at least one of the cleaning elements and/or the items, whereby the cleaning elements dry or polish the items, wherein the steam distribution system is operable on insertion of an end of said items into the enclosure.

Abstract: A device for drying and polishing a plurality of items including glasses and cutlery is provided. The device includes a plurality of movable cleaning elements configured to at least one of dry and polish the items and an enclosure defining a chamber, the movable cleaning elements being within the chamber. The enclosure includes a first aperture at a first enclosure location, a second aperture at a second enclosure location, a third aperture at a third enclosure location, and a channel assembly located in the chamber. The first aperture is adapted to receive a first item, the second aperture is adapted to receive a second item, and the third aperture is adapted to enable the second item to exit the chamber. The channel assembly defines a channel path between the second aperture and the third aperture.

Abstract: The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.

Abstract: A device for drying and polishing a plurality of items including glasses and cutlery is provided. The device includes a plurality of movable cleaning elements configured to at least one of dry and polish the items and an enclosure defining a chamber, the movable cleaning elements being within the chamber. The enclosure includes a first aperture at a first enclosure location, a second aperture at a second enclosure location, a third aperture at a third enclosure location, and a channel assembly located in the chamber. The first aperture is adapted to receive a first item, the second aperture is adapted to receive a second item, and the third aperture is adapted to enable the second item to exit the chamber. The channel assembly defines a channel path between the second aperture and the third aperture.

Abstract: The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.