Patents by Inventor Tomoaki Hiwatashi

Tomoaki Hiwatashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8236911
    Abstract: Provided is a water-soluble resin which gives a conditioning effect when it is used in a hair cosmetic material containing an anionic surfactant, or the like. A water-soluble resin having a structure corresponding to a copolymer of a monomer mixture containing a vinylic monomer (A) having a hydroxyl group and an amido bond, and a vinylic monomer (B) having a cationic group.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: August 7, 2012
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Shoya Yoda, Tomoaki Hiwatashi, Yuko Yoda
  • Publication number: 20110014147
    Abstract: Provided is a water-soluble resin which gives a conditioning effect when it is used in a hair cosmetic material containing an anionic surfactant, or the like. A water-soluble resin having a structure corresponding to a copolymer of a monomer mixture containing a vinylic monomer (A) having a hydroxyl group and an amido bond, and a vinylic monomer (B) having a cationic group.
    Type: Application
    Filed: September 24, 2010
    Publication date: January 20, 2011
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Shoya YODA, Tomoaki Hiwatashi, Yuko Yoda
  • Publication number: 20100016520
    Abstract: In order to provide a radiation-curable composition which exhibits corrosion proof while maintaining mechanical properties and preservation stability and an optical recording medium using the composition, the radiation-curable composition for an optical recording medium comprises a urethane (meth)acrylate compound (A) and a compound (C) containing one or more epoxy groups, and has an acid content of 1.0×10?4 eq/g or less.
    Type: Application
    Filed: December 17, 2007
    Publication date: January 21, 2010
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Akira Esaki, Tomoaki Hiwatashi
  • Publication number: 20070167593
    Abstract: Provided is a water-soluble resin which gives a conditioning effect when it is used in a hair cosmetic material containing an anionic surfactant, or the like. A water-soluble resin having a structure corresponding to a copolymer of a monomer mixture containing a vinylic monomer (A) having a hydroxyl group and an amido bond, and a vinylic monomer (B) having a cationic group.
    Type: Application
    Filed: February 9, 2005
    Publication date: July 19, 2007
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Shoya Yoda, Tomoaki Hiwatashi, Yuko Yoda
  • Publication number: 20070166250
    Abstract: The present invention discloses a cosmetic polymer composition containing a straight-chain block copolymer, where the copolymer having a unit derived from a compound having an ethylenic unsaturated bond, having a number-average molecular weight of 1.0×103 to 1.0×106, and having at least two or more glass transition points or melting points; a hair cosmetic polymer composition containing a copolymer a copolymer capable of forming a film having a Young's modulus of 50 MPa or larger and a fracture-point elongation of 100% or larger, and dispersible into water and/or alcohol; and a cosmetic material containing these compositions.
    Type: Application
    Filed: March 29, 2007
    Publication date: July 19, 2007
    Inventors: Tomoaki HIWATASHI, Minako SHIBATA, Osamu NISHIZAWA, Masato ONOE, Yasuo KITANI
  • Publication number: 20050249692
    Abstract: A polymer having a weight-average molecular weight of 5.0×103 to 1.0×107 and comprising a repeating unit represented by formula (I) below: wherein R1 denotes a hydrogen atom or a hydrocarbon group, R2 denotes a hydrogen atom or a methyl group, X denotes a bivalent connecting group, m denotes 0 or 1, and the guanidino group may form an acid-addition salt is disclosed.
    Type: Application
    Filed: August 28, 2003
    Publication date: November 10, 2005
    Inventors: Tomoaki Hiwatashi, Shinsuke Oouchi, Yasuo Kitani
  • Publication number: 20040223933
    Abstract: The present invention discloses a cosmetic polymer composition containing a straight-chain block copolymer, where the copolymer having a unit derived from a compound having an ethylenic unsaturated bond, having a number-average molecular weight of 1.0×103 to 1.0×106, and having at least two or more glass transition points or melting points; a hair cosmetic polymer composition containing a copolymer a copolymer capable of forming a film having a Young's modulus of 50 MPa or larger and a fracture-point elongation of 100% or larger, and dispersible into water and/or alcohol; and a cosmetic material containing these compositions.
    Type: Application
    Filed: March 12, 2004
    Publication date: November 11, 2004
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Tomoaki Hiwatashi, Minako Shibata, Osamu Nishizawa, Masato Onoe, Yasuo Kitani
  • Patent number: 6616920
    Abstract: The invention provides a nail-care polymer with great adhesion to nail, good surface smoothness and gloss and high coating durability for use in a nail-care product.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: September 9, 2003
    Assignee: Mitsubishi Chemical America, Inc.
    Inventors: Kayo Ito, Tomoaki Hiwatashi, Shigeoki Kawaguchi, Yukio Saito, Kazuhide Hayama
  • Publication number: 20020172655
    Abstract: A cosmetic-use polymer having a weight average molecular weight of 5.0·103-1.
    Type: Application
    Filed: February 28, 2002
    Publication date: November 21, 2002
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Tomoaki Hiwatashi, Shinsuke Oouchi, Yasuo Kitani
  • Patent number: 6375932
    Abstract: A hair cosmetic composition having an excellent hair setting property, and which imparts to hair good flexibility and a good finish feeling. The hair cosmetic composition comprises (a) a water-soluble amine-oxide-containing polymer having a weight-average molecular weight of 10,000 to 500,000 and (b) a water-soluble polymer selected from the group consisting of nonionic, cationic, anionic and amphoteric polymers. The weight ratio of component (a) to component (b) falls within a range of from 1:10 to 10:1. Components (a) and (b) are incorporated in a total amount of from 0.1 to 10 wt. % based on the hair cosmetic composition.
    Type: Grant
    Filed: September 9, 1997
    Date of Patent: April 23, 2002
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tomoaki Hiwatashi, Yasuo Kitani, Kanji Narazaki, Kayo Itou, Kazuhide Hayama
  • Patent number: 6123933
    Abstract: A hair cosmetic composition comprising an amine-oxide-containing water-soluble resin having a weight-average molecular weight of 5,000 to 1,000,000. The hair cosmetic composition of the present invention has excellent setting force, conditioning effects and hair-washing property and being free from stickiness.
    Type: Grant
    Filed: July 17, 1996
    Date of Patent: September 26, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Kazuhide Hayama, Yasuo Kitani, Tomoaki Hiwatashi
  • Patent number: 5362485
    Abstract: A hair cosmetic composition containing a graft copolymer or an alternating block copolymer, each of which comprises a first unit containing a polysiloxane group and a second unit containing a polymer of unsaturated monomers is provided. The first and second units are linked by sulfide linkage. The hair cosmetic composition provides hair with softness, luster, combing smoothness, styling ease, enhanced volume, and has good hairstyle retainability and damage-restoring characteristics.
    Type: Grant
    Filed: July 26, 1993
    Date of Patent: November 8, 1994
    Assignee: Mitsubishi Petrochemical Company, Ltd.
    Inventors: Kazuhide Hayama, Kanji Narazaki, Yukio Saitoh, Tomoaki Hiwatashi, Isao Itoh, Sigeoki Kawaguchi