Patents by Inventor Tomoaki Kawakami

Tomoaki Kawakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110304741
    Abstract: The image pickup apparatus includes an image sensor unit including an optical system forming an optical image of an object placed on a stage part and plural image sensors each of which captures part of the optical image, a drive mechanism relativity moving the stage part and the image sensor unit, and a processing part causing the image sensor unit to perform plural image capturing operations with causing the drive mechanism to relatively move the stage part and the image sensor unit after each image capturing operation, and combining the plural captured images to produce a whole image covering the whole image capturing area. The plural image sensors are arranged such that an effective diameter of the optical system necessary to introduce light from the stage part to all the plural image sensors is smaller than a diameter of a circle circumscribed to the whole image capturing area.
    Type: Application
    Filed: June 15, 2011
    Publication date: December 15, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tomoaki KAWAKAMI
  • Patent number: 7947790
    Abstract: A porous membrane of vinylidene fluoride resin excellent in hydrophilicity and having a good balance among strength, elongation and water permeation rate, which is thus useful as a microfiltration membrane or a separator of battery. The porous membrane is formed from a copolymer of 100 mols of a vinylidene fluoride monomer and 0.01-10.0 mols of a hydrophilic monomer having at least one species of hydrophilic group selected from epoxy group, hydroxy group, carboxy group, ester group, amide group and acid anhydride group.
    Type: Grant
    Filed: April 9, 2004
    Date of Patent: May 24, 2011
    Assignee: Kureha Corporation
    Inventors: Takumi Katsurao, Tomoaki Kawakami, Toshio Hosokawa
  • Patent number: 7943707
    Abstract: A monomer comprising vinylidene fluoride as a principal component is suspension-polymerized by supplying the monomer in division to a polymerization system containing a polymerization initiator at a pressure below a critical pressure Pcr (=4.38 MPa) of vinylidene fluoride and at a pressure above Pcr. As a result, a vinylidene fluoride polymer having excellent high-temperature coloring resistance and with remarkably less elution of organic matter and ionic components is produced, without using a specific halogenated hydrocarbon and without incurring troublesome labor and cost for recovery thereof.
    Type: Grant
    Filed: November 21, 2005
    Date of Patent: May 17, 2011
    Assignee: Kureha Corporation
    Inventors: Tomoaki Kawakami, Takumi Katsurao
  • Publication number: 20100044901
    Abstract: A water treatment membrane comprising a porous membrane of vinylidene fluoride resin, wherein 0.01-5 wt. parts of photocatalytic titanium oxide is uniformly dispersed in 100 wt. parts of the vinylidene fluoride resin. The water treatment membrane can solve problems accompanying the hydrophobicity of a porous membrane of vinylidene fluoride resin while taking advantage of excellent mechanical properties, weatherablility, chemical resistance, etc., thereof.
    Type: Application
    Filed: October 26, 2009
    Publication date: February 25, 2010
    Inventors: Takumi Katsurao, Tomoaki Kawakami, Toshio Hosokawa
  • Publication number: 20090135398
    Abstract: An exposure apparatus includes an illumination optical system configured to illuminate an original by a luminous flux from a light source and a projection optical system configured to project a pattern of the original onto a substrate. The illumination optical system includes a generator configured to form an effective light source as a light intensity distribution on a surface that has a Fourier transformation relationship with the original and an exposure dose adjuster arranged closer to the light source than the generator and configured to control an exposure dose on an exposure surface. The exposure dose adjuster includes a transmittance adjuster configured to discretely adjust a transmittance of the luminous flux, a zoom optical system configured to adjust a diameter of the luminous flux, and an aperture having a predetermined aperture area that defines a diameter of the luminous flux that has been adjusted by the zoom optical system.
    Type: Application
    Filed: November 20, 2008
    Publication date: May 28, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tomoaki Kawakami
  • Publication number: 20090075216
    Abstract: A computer-readable storage medium storing a program for causing a computer to execute determination of an exposure condition for use in illuminating an original plate with an illumination optical system and projecting an image of a pattern of the original plate onto a substrate through a projection optical system. The program causes the computer to perform operations including setting a light intensity distribution on a pupil plane in the illumination optical system based on a constraint condition concerning an optical element constituting the illumination optical system, calculating the image of the pattern of the original plate to be projected onto the substrate using the light intensity distribution, and determining the exposure condition for exposing the substrate with the image of the pattern of the original plate based on a calculation result of the image of the pattern of the original plate and the constraint condition.
    Type: Application
    Filed: September 11, 2008
    Publication date: March 19, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tomoaki Kawakami
  • Publication number: 20090039014
    Abstract: A water treatment membrane comprising a porous membrane of vinylidene fluoride resin, wherein 0.01-5 wt. parts of photocatalytic titanium oxide is uniformly dispersed in 100 wt. parts of the vinylidene fluoride resin. The water treatment membrane can solve problems accompanying the hydrophobicity of a porous membrane of vinylidene fluoride resin while taking advantage of excellent mechanical properties, weatherability, chemical resistance, etc., thereof.
    Type: Application
    Filed: June 16, 2005
    Publication date: February 12, 2009
    Inventors: Takumi Katsurao, Tomoaki Kawakami, Toshio Hosokawa
  • Publication number: 20090040497
    Abstract: The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate an original with light from a light source, a projection optical system configured to project a pattern image of the original onto a substrate, an optical integrator configured to form a pupil plane of the illumination optical system on an exit surface of the optical integrator, a first light-shielding unit and a second light-shielding unit each of which includes a plurality of light-shielding plates configured to shield certain components of the light from the light source, and a driving unit configured to drive the plurality of light-shielding plates.
    Type: Application
    Filed: August 7, 2008
    Publication date: February 12, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tomoaki Kawakami
  • Publication number: 20090015811
    Abstract: An exposure apparatus includes a light source configured to generate light having a wavelength of 250 nm or less, an illumination optical system comprising an optical element having synthetic quartz as a lens material and configured to illuminate an original plate using the light generated by the light source, and a projection optical system configured to project a pattern of the original plate onto a substrate. A value of an absorption coefficient of a hydroxyl group of the optical element having an infrared absorption band at 3585 cm?1 is within a range which is determined depending on a wavelength of the light generated by the light source.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 15, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tomoaki Kawakami
  • Publication number: 20080249201
    Abstract: A hydrophilic vinylidene fluoride resin composition, comprising: porous vinylidene fluoride polymer particles and a hydrophilic polymer having a weight-average molecular weight of at least 2×105 contained in the pores of the porous vinylidene fluoride polymer particles. The composition is preferably obtained by subjecting a slurry containing porous vinylidene fluoride polymer particles after suspension polymerization to an appropriate degree of heat treatment for adjusting the amount of residual polymerization initiator, then impregnating the Polymer particles with a hydrophilic monomer and polymerizing the monomer. The thus-obtained vinylidene fluoride resin composition exhibits persistent hydrophilicity and good processability.
    Type: Application
    Filed: January 30, 2006
    Publication date: October 9, 2008
    Applicant: KUREHA CORPORATION
    Inventors: Tomoaki Kawakami, Toshio Hosokawa
  • Publication number: 20080071045
    Abstract: A monomer comprising vinylidene fluoride as a principal component is suspension-polymerized by supplying the monomer in division to a polymerization system containing a polymerization initiator at a pressure below a critical pressure Pcr (=4.38 MPa) of vinylidene fluoride and at a pressure above Pcr. As a result, a vinylidene fluoride polymer having excellent high-temperature coloring resistance and with remarkably less elution of organic matter and ionic components is produced, without using a specific halogenated hydrocarbon and without incurring troublesome labor and cost for recovery thereof.
    Type: Application
    Filed: November 21, 2005
    Publication date: March 20, 2008
    Inventors: Tomoaki Kawakami, Takumi Katsurao
  • Publication number: 20080036992
    Abstract: An exposure apparatus comprises an illumination optical system and a projection optical system. The illumination optical system includes an optical integrator configured to emit a plurality of light fluxes from an exit surface thereof, a diffraction optical element configured to form a predetermined light intensity distribution on an incident surface of the optical integrator, and a polarization optical element configured to adjust a polarization state of the incident light. The polarization optical element has a pattern with which the polarization optical element functions as a birefringent element, the pattern changing in density between a first direction and a second direction perpendicular to the first direction, and having a sub wavelength structure having a cycle not more than a wavelength of the light from the light source, and the polarization optical element is arranged near or on the incident surface on which the diffraction optical element forms the light intensity distribution.
    Type: Application
    Filed: August 10, 2007
    Publication date: February 14, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kenichiro Mori, Tomoaki Kawakami
  • Patent number: 7209218
    Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: April 24, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tomoaki Kawakami, Ken-ichiro Shinoda
  • Publication number: 20070024839
    Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.
    Type: Application
    Filed: July 27, 2006
    Publication date: February 1, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tomoaki Kawakami, Ken-ichiro Shinoda
  • Publication number: 20060148912
    Abstract: A porous membrane of vinylidene fluoride resin excellent in hydrophilicity and having a good balance among strength, elongation and water permeation rate, which is thus useful as a microfiltration membrane or a separator of battery. The porous membrane is formed from a copolymer of 100 mols of a vinylidene fluoride monomer and 0.01-10.0 mols of a hydrophilic monomer having at least one species of hydrophilic group selected from epoxy group, hydroxy group, carboxy group, ester group, amide group and acid anhydride group.
    Type: Application
    Filed: April 9, 2004
    Publication date: July 6, 2006
    Inventors: Takumi Katsurao, Tomoaki Kawakami, Toshio Hosokawa