Patents by Inventor Tomoaki Mekata

Tomoaki Mekata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi step coat
    Patent number: 5968592
    Abstract: The objective of the invention is to provide a resist material deposition method which allows reliable deposition using a small amount of resist material without unevenness.The method of the present invention comprises the following processing steps: a first processing step in which the resist material is fed to the central portion of the semiconductor substrate, and a second processing step in which the aforementioned semiconductor substrate is rotated at a high velocity so that the aforementioned resist material spreads out smoothly toward the circumferential portion of the aforementioned semiconductor substrate. In the first processing step, the semiconductor substrate is rotated at a velocity in the range of 1000-1500 rpm; in the second processing step, the semiconductor substrate is rotated at a velocity in the range of 3000-3800 rpm.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: October 19, 1999
    Assignee: Texas Instruments Incorporated
    Inventors: Masataka Yoshida, Tomoaki Mekata