Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

Abstract: A control device configured to control a power to be supplied to a heater unit. The control device cuts off the power to be supplied to a heating portion when it is determined that an event where a maximum temperature that the processing liquid within the heater unit reaches exceeds a processing liquid upper limit temperature is likely to occur even when a supply of the power to the heating portion is stopped based on an actual temperature of the processing liquid measured by a temperature detector under an assumption that a flow of the processing liquid flowing in a processing liquid supply line is stopped.

Abstract: A control device configured to control a power to be supplied to a heater unit. The control device cuts off the power to be supplied to a heating portion when it is determined that an event where a maximum temperature that the processing liquid within the heater unit reaches exceeds a processing liquid upper limit temperature is likely to occur even when a supply of the power to the heating portion is stopped based on an actual temperature of the processing liquid measured by a temperature detector under an assumption that a flow of the processing liquid flowing in a processing liquid supply line is stopped.