Patents by Inventor Tomoaki Uchiyama

Tomoaki Uchiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11862504
    Abstract: A mask-integrated surface protective tape, which has at least a substrate film and a mask material layer, wherein the mask material layer is provided directly on the substrate film, or is provided on the substrate film through a temporary-adhesive layer, and wherein a parallel ray transmittance of the mask material layer at a wavelength region of 355 nm is 30% or less; and a method of producing a semiconductor chip.
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: January 2, 2024
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Akira Akutsu, Tomoaki Uchiyama
  • Patent number: 11707804
    Abstract: A mask-integrated surface protective tape, containing: a substrate film; a temporary-adhesive layer provided on the substrate film; and a mask material layer provided on the temporary-adhesive layer; wherein the mask material layer and the temporary-adhesive layer each contain a (meth)acrylic copolymer; and wherein the mask-integrated surface protective tape is used for a method of producing a semiconductor chip utilizing a plasma-dicing.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: July 25, 2023
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki Yokoi, Tomoaki Uchiyama, Yoshifumi Oka
  • Patent number: 11171032
    Abstract: After grinding is performed on a semiconductor wafer, the semiconductor wafer is fixed on the electrostatic chuck so as to cause the front surface side of the semiconductor wafer to face the electrostatic chuck. Next, a masking material layer is formed on the rear surface of the ground semiconductor wafer in a state where a surface protection tape is bonded thereto. Then, a masking tape is cut by irradiating, from the rear surface side, portions thereof corresponding to a plurality of streets appropriately formed in a grid shape in a pattern surface with a laser beam so as to form openings for the streets in the semiconductor wafer. Then, SF6 plasma irradiation is performed from the rear surface side so as to etch the semiconductor wafer that has been exposed in the street portions. Finally, ashing is performed using O2 plasma.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: November 9, 2021
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Kazuki Mikami, Tomoaki Uchiyama, Akira Akutsu
  • Publication number: 20210226244
    Abstract: The invention provides a fuel cell module that can inhibit reduction in the load applied to the fuel cell stack and that can facilitate assembly. In the fuel cell module of this disclosure, each end plate has a groove on the side not facing the fuel cell stack, as viewed in the stacking direction of the fuel cell stack. Each fastening member also has a band part, and an anchoring part that is disposed on at least one end of the band part. The anchoring part is connected to the end plate by the connecting member, the tip section of the anchoring part having a shape complementary to the groove of the end plate in at least one direction within the plane of the end plate, and being fitted into the groove of the end plate, whereby the fastening member is fastened to the end plate.
    Type: Application
    Filed: December 16, 2020
    Publication date: July 22, 2021
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Tomoaki UCHIYAMA
  • Patent number: 10916441
    Abstract: A surface side is irradiated with an SF6 gas plasma to etch a semiconductor wafer which has been peeled off in street portions, and divide the semiconductor wafer into a plurality of individual semiconductor chips. A removing agent is subsequently supplied from the surface side. At that time, it is preferable that the semiconductor wafer divided into the plurality of chips is rotated at high speed. Accordingly, a mask material layer remaining on the surface is removed by the removing agent. Moreover, the removing agent is preferably an organic solvent, and more preferably, methyl ethyl ketone, ethanol, and ethyl acetate, or a combination of these.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: February 9, 2021
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Tomoaki Uchiyama, Akira Akutsu, Hirotoki Yokoi
  • Patent number: 10916439
    Abstract: A mask-integrated surface protective film, containing: a substrate film, and a mask material layer provided on the substrate film; wherein the mask material layer is an ethylene-vinyl acetate copolymer resin, an ethylene-methyl acrylate copolymer resin, or an ethylene-butyl acrylate copolymer resin; and wherein the thickness of the mask material layer is 50 ?m or less.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: February 9, 2021
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki Yokoi, Tomoaki Uchiyama, Yoshifumi Oka
  • Patent number: 10818955
    Abstract: A fuel cell unit includes: a fuel cell module including a fuel cell stack including: a stacked body in which unit cells are stacked; a pair of end plates sandwiching the stacked body in a stacking direction; a facing member facing an outer surface of the stacked body extending along the stacking direction; and first and second restriction members arranged between the facing member and the stacked body, and restricting a position of the stacked body in a direction perpendicular to the stacking direction by contacting with the outer surface; and fixing members fixing the fuel cell module to a fixed member.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: October 27, 2020
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Tomoaki Uchiyama, Masayuki Ito
  • Publication number: 20200144095
    Abstract: After grinding is performed on a semiconductor wafer, the semiconductor wafer is fixed on the electrostatic chuck so as to cause the front surface side of the semiconductor wafer to face the electrostatic chuck. Next, a masking material layer is formed on the rear surface of the ground semiconductor wafer in a state where a surface protection tape is bonded thereto. Then, a masking tape is cut by irradiating, from the rear surface side, portions thereof corresponding to a plurality of streets appropriately formed in a grid shape in a pattern surface with a laser beam so as to form openings for the streets in the semiconductor wafer. Then, SF6 plasma irradiation is performed from the rear surface side so as to etch the semiconductor wafer that has been exposed in the street portions. Finally, ashing is performed using O2 plasma.
    Type: Application
    Filed: January 9, 2020
    Publication date: May 7, 2020
    Inventors: Kazuki Mikami, Tomoaki Uchiyama, Akira Akutsu
  • Publication number: 20190378747
    Abstract: A mask-integrated surface protective tape, which has at least a substrate film and a mask material layer, wherein the mask material layer is provided directly on the substrate film, or is provided on the substrate film through a temporary-adhesive layer, and wherein a parallel ray transmittance of the mask material layer at a wavelength region of 355 nm is 30% or less; and a method of producing a semiconductor chip.
    Type: Application
    Filed: August 23, 2019
    Publication date: December 12, 2019
    Applicant: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Akira AKUTSU, Tomoaki UCHIYAMA
  • Publication number: 20190371618
    Abstract: A surface side is irradiated with an SF6 gas plasma to etch a semiconductor wafer which has been peeled off in street portions, and divide the semiconductor wafer into a plurality of individual semiconductor chips. A removing agent is subsequently supplied from the surface side. At that time, it is preferable that the semiconductor wafer divided into the plurality of chips is rotated at high speed. Accordingly, a mask material layer remaining on the surface is removed by the removing agent. Moreover, the removing agent is preferably an organic solvent, and more preferably, methyl ethyl ketone, ethanol, and ethyl acetate, or a combination of these.
    Type: Application
    Filed: August 13, 2019
    Publication date: December 5, 2019
    Inventors: Tomoaki Uchiyama, Akira Akutsu, Hirotoki Yokoi
  • Publication number: 20190198907
    Abstract: A fuel cell unit includes; a fuel cell module including a fuel cell stack including: a stacked body in which unit cells are stacked; a pair of end plates sandwiching the stacked body in a stacking direction; a facing member facing an outer surface of the stacked body extending along the stacking direction; and first and second restriction members arranged between the facing member and the stacked body, and restricting a position of the stacked body in a direction perpendicular to the stacking direction by contacting with the outer surface; and fixing members fixing the fuel cell module to a fixed member.
    Type: Application
    Filed: November 2, 2018
    Publication date: June 27, 2019
    Applicant: Toyota Jidosha Kabushiki Kaisha
    Inventors: Tomoaki Uchiyama, Masayuki Ito
  • Patent number: 10307866
    Abstract: A method of producing a semiconductor chip, including the following steps (a) to (d): (a) a step of, in the state of having laminated a mask-integrated surface protective tape on the side of a patterned surface of a semiconductor wafer, grinding the backing-face of the semiconductor wafer; laminating a wafer fixing tape on the backing-face side of the ground semiconductor wafer; and supporting and fixing the wafer to a ring flame; (b) a step of, after peeling the surface protective tape thereby to expose the mask material layer on top, forming an opening of a street of the semiconductor wafer; (c) a plasma dicing step of segmentalizing the semiconductor wafer by a plasma irradiation to singulate it into semiconductor chips; and (d) an ashing step of removing the mask material layer by the plasma irradiation.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: June 4, 2019
    Assignee: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki Yokoi, Tomoaki Uchiyama, Yoshifumi Oka
  • Publication number: 20180226359
    Abstract: A mask-integrated surface protective tape, containing: a substrate film; a temporary-adhesive layer provided on the substrate film; and a mask material layer provided on the temporary-adhesive layer; wherein the mask material layer and the temporary-adhesive layer each contain a (meth)acrylic copolymer; and wherein the mask-integrated surface protective tape is used for a method of producing a semiconductor chip utilizing a plasma-dicing.
    Type: Application
    Filed: January 11, 2018
    Publication date: August 9, 2018
    Applicant: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki YOKOI, Tomoaki UCHIYAMA, Yoshifumi OKA
  • Publication number: 20180185964
    Abstract: A method of producing a semiconductor chip, including the following steps (a) to (d): (a) a step of, in the state of having laminated a mask-integrated surface protective tape on the side of a patterned surface of a semiconductor wafer, grinding the backing-face of the semiconductor wafer; laminating a wafer fixing tape on the backing-face side of the ground semiconductor wafer; and supporting and fixing the wafer to a ring flame; (b) a step of, after peeling the surface protective tape thereby to expose the mask material layer on top, forming an opening of a street of the semiconductor wafer; (c) a plasma dicing step of segmentalizing the semiconductor wafer by a plasma irradiation to singulate it into semiconductor chips; and (d) an ashing step of removing the mask material layer by the plasma irradiation.
    Type: Application
    Filed: January 11, 2018
    Publication date: July 5, 2018
    Applicant: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki YOKOI, Tomoaki UCHIYAMA, Yoshifumi OKA
  • Publication number: 20180158691
    Abstract: A mask-integrated surface protective film, containing: a substrate film, and a mask material layer provided on the substrate film; wherein the mask material layer is an ethylene-vinyl acetate copolymer resin, an ethylene-methyl acrylate copolymer resin, or an ethylene-butyl acrylate copolymer resin; and wherein the thickness of the mask material layer is 50 ?m or less.
    Type: Application
    Filed: January 11, 2018
    Publication date: June 7, 2018
    Applicant: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hirotoki YOKOI, Tomoaki UCHIYAMA, Yoshifumi OKA
  • Patent number: 9768458
    Abstract: A fuel cell has an electrolyte membrane of 5 to 10 ?m in thickness. A control device for this fuel cell comprises: a controller configured to control an amount of power generation by the fuel cell according to a required amount of electric power; and a power generation reducer configured to reduce the amount of power generation by the fuel cell at a humidity of an electrolyte membrane of 95 to 98% RH to be lower than the amount of power generation at the humidity of the electrolyte membrane of lower than 95% RH.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: September 19, 2017
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Tomoaki Uchiyama, Masato Nakajima
  • Patent number: 9397353
    Abstract: The object is to suppress degradation of the durability of an electrolyte membrane caused by deformation by expansion and contraction of the electrolyte membrane. A controller 150 calculates a humidity P of an electrolyte membrane 112 based on a cell resistance value (step S11) and determines whether the humidity P of the electrolyte membrane 112 is less than a humidity threshold A (step S12). When the humidity P is less than the humidity threshold A, the controller 150 determines that a dimensional change rate of the electrolyte membrane is not greater than a predetermined value and performs a process of increasing the humidity of the electrolyte membrane 112 (step S13). The predetermined value is a dimensional change rate that is unlikely to have damage by drying stress.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: July 19, 2016
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Tomoaki Uchiyama
  • Publication number: 20150244013
    Abstract: A fuel cell has an electrolyte membrane of 5 to 10 ?m in thickness. A control device for this fuel cell comprises: a controller configured to control an amount of power generation by the fuel cell according to a required amount of electric power; and a power generation reducer configured to reduce the amount of power generation by the fuel cell at a humidity of an electrolyte membrane of 95 to 98% RH to be lower than the amount of power generation at the humidity of the electrolyte membrane of lower than 95% RH.
    Type: Application
    Filed: August 31, 2012
    Publication date: August 27, 2015
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Tomoaki Uchiyama, Masato Nakajima
  • Publication number: 20140178778
    Abstract: The object is to suppress degradation of the durability of an electrolyte membrane caused by deformation by expansion and contraction of the electrolyte membrane. A controller 150 calculates a humidity P of an electrolyte membrane 112 based on a cell resistance value (step S11) and determines whether the humidity P of the electrolyte membrane 112 is less than a humidity threshold A (step S12). When the humidity P is less than the humidity threshold A, the controller 150 determines that a dimensional change rate of the electrolyte membrane is not greater than a predetermined value and performs a process of increasing the humidity of the electrolyte membrane 112 (step S13). The predetermined value is a dimensional change rate that is unlikely to have damage by drying stress.
    Type: Application
    Filed: September 15, 2011
    Publication date: June 26, 2014
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Tomoaki Uchiyama
  • Patent number: 8420164
    Abstract: The present invention relates to a solid type rubber-based pressure-sensitive adhesive composition, which is prepared by adding a tackifier, a softener, and an isocyanate-based crosslinking agent reactable with active hydrogen into an acrylic rubber containing a monomer having an active hydrogen-containing functional group as a copolymerization component to thereby obtain a solventless and nonaqueous pressure-sensitive adhesive composition, and particularly it relates to a solid type rubber-based pressure-sensitive adhesive composition having the above-mentioned constitution, in which the above-mentioned acrylic rubber includes a copolymer containing butyl acrylate as a main component, and as the copolymerization component a monomer having a hydroxyl group or a carboxyl group as the active hydrogen-containing functional group.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: April 16, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Tomoo Yamaguchi, Yasunobu Ina, Tomoaki Uchiyama, Minoru Yagi