Abstract: According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.

Abstract: A method and system for appearance inspection of a core of a heat exchanger provided with fins and tubes, performing averaging and dynamic binarization on the imaging data to extract an image of only a tube, then calculating, with respect to the extracted tube image, a center axis across a long direction of the tube comprised of the center coordinates of the tube width direction, comparing the discovered center axis with a reference value to find the maximum displacement across the long direction of the tube, and judging the tube is a defect when the maximum displacement is greater than a predetermined threshold.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: A fin inspection method comprising a step of having an imaging device capture an image of the core and inputting into an image processing device the image data for storage, a step of setting a first region in the image data in which an image of the entire core is captured and setting a second region in which an image of at least a portion of all of the tubes is captured so as to identify position information of the tubes, a step of setting a third region for fin detection between adjacent tubes based on the identified position information of the tubes, a step of performing binarization and noise removal in the third region to obtain an image of the fins and identifying from the image of the fins the edge position information of the fins along a long direction of the tubes, and a step of performing statistical processing of the pitch intervals based on the edge position information of the fins and judging fin defects.

Abstract: A fin inspection method comprising a step of having an imaging device capture an image of the core and inputting into an image processing device the image data for storage, a step of setting a first region in the image data in which an image of the entire core is captured and setting a second region in which an image of at least a portion of all of the tubes is captured so as to identify position information of the tubes, a step of setting a third region for fin detection between adjacent tubes based on the identified position information of the tubes, a step of performing binarization and noise removal in the third region to obtain an image of the fins and identifying from the image of the fins the edge position information of the fins along a long direction of the tubes, and a step of performing statistical processing of the pitch intervals based on the edge position information of the fins and judging fin defects.

Abstract: An appearance inspection method and system of a core of a heat exchanger provided with fins and tubes including identifying a region in which an image of a single tube is captured, performing averaging and dynamic binarization of the image data in this region to extract only the image of the tube, dividing this region into a plurality of blocks, finding the smallest rectangle surrounding a tube at each divided block to find a width dimension of the tube, comparing the tube width dimension at each block found with a predetermined threshold value, and judging a part as good when all of the tube width dimensions at the blocks are the predetermined threshold value or less.

Abstract: A method and system for appearance inspection of a core of a heat exchanger provided with fins and tubes, performing averaging and dynamic binarization on the imaging data to extract an image of only a tube, then calculating, with respect to the extracted tube image, a center axis across a long direction of the tube comprised of the center coordinates of the tube width direction, comparing the discovered center axis with a reference value to find the maximum displacement across the long direction of the tube, and judging the tube is a defect when the maximum displacement is greater than a predetermined threshold.

Abstract: A metal film etching method etches selectively a metal film formed on a layer insulating film provided with viaholes so as to cover the surface of the layer insulating film and fill up the viaholes so that the metal film excluding portions there of filling up the viaholes are removed completely without forming a pit in the portions of the metal film filling up the viaholes. The metal film etching method uses a mixed reactive gas of a gas containing fluorine atoms, a gas containing chlorine atoms and oxygen gas.