Patents by Inventor Tomofumi Matsuno

Tomofumi Matsuno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning apparatus
    Patent number: 6671918
    Abstract: A substrate cleaning apparatus of the present invention includes one sheet roll wound with one end of a polishing sheet that is arranged to be in contact with the surface of a liquid crystal panel, and the other sheet roll for rolling up the polishing sheet from the other end. The substrate cleaning apparatus further includes a rotating unit provided with a motor, a belt, and a rotation shaft for rotating the polishing sheet and the pair of sheet rolls with respect to the liquid crystal panel. Thus, the substrate cleaning apparatus can be provided which is capable of reducing an operation time required for removing foreign matters, enhancing operation efficiency, stably and reliably removing foreign matters, and restraining operation time even if the size of the substrate increases.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: January 6, 2004
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tomofumi Matsuno, Mitsuo Uemura, Kazuya Yoshimura
  • Substrate cleaning apparatus
    Publication number: 20010054210
    Abstract: A substrate cleaning apparatus of the present invention includes one sheet roll wound with one end of a polishing sheet that is arranged to be in contact with the surface of a liquid crystal panel, and the other sheet roll for rolling up the polishing sheet from the other end. The substrate cleaning apparatus further includes a rotating unit provided with a motor, a belt, and a rotation shaft for rotating the polishing sheet and the pair of sheet rolls with respect to the liquid crystal panel. Thus, the substrate cleaning apparatus can be provided which is capable of reducing an operation time required for removing foreign matters, enhancing operation efficiency, stably and reliably removing foreign matters, and restraining operation time even if the size of the substrate increases.
    Type: Application
    Filed: June 14, 2001
    Publication date: December 27, 2001
    Inventors: Tomofumi Matsuno, Mitsuo Uemura, Kazuya Yoshimura