Patents by Inventor Tomoharu Fujiwara
Tomoharu Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10338479Abstract: A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.Type: GrantFiled: July 11, 2018Date of Patent: July 2, 2019Assignee: NIKON CORPORATIONInventors: Yoji Watanabe, Soichi Owa, Tomoharu Fujiwara
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Patent number: 10338472Abstract: A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is formed by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern.Type: GrantFiled: December 12, 2017Date of Patent: July 2, 2019Assignee: NIKON CORPORATIONInventor: Tomoharu Fujiwara
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Patent number: 10317346Abstract: A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180° (?) become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.Type: GrantFiled: August 30, 2012Date of Patent: June 11, 2019Assignee: NIKON CORPORATIONInventor: Tomoharu Fujiwara
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Publication number: 20190164900Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.Type: ApplicationFiled: January 31, 2019Publication date: May 30, 2019Applicant: NIKON CORPORATIONInventors: Yuji SHIBA, Tomoharu FUJIWARA, Nobutaka MAGOME
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Publication number: 20190146354Abstract: A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.Type: ApplicationFiled: January 11, 2019Publication date: May 16, 2019Applicant: Nikon CorporationInventors: Soichi Owa, Yoji Watanabe, Tomoharu Fujiwara
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Patent number: 10236259Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.Type: GrantFiled: March 7, 2018Date of Patent: March 19, 2019Assignee: NIKON CORPORATIONInventors: Yuji Shiba, Tomoharu Fujiwara, Nobutaka Magome
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Patent number: 10222705Abstract: A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.Type: GrantFiled: April 12, 2017Date of Patent: March 5, 2019Assignee: Nikon CorporationInventors: Soichi Owa, Yoji Watanabe, Tomoharu Fujiwara
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Publication number: 20190049857Abstract: A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.Type: ApplicationFiled: July 11, 2018Publication date: February 14, 2019Applicant: NIKON CORPORATIONInventors: Yoji WATANABE, Soichi OWA, Tomoharu FUJIWARA
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Patent number: 10054858Abstract: A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.Type: GrantFiled: September 22, 2011Date of Patent: August 21, 2018Assignee: NIKON CORPORATIONInventors: Yoji Watanabe, Soichi Owa, Tomoharu Fujiwara
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Publication number: 20180197820Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.Type: ApplicationFiled: March 7, 2018Publication date: July 12, 2018Applicant: NIKON CORPORATIONInventors: Yuji SHIBA, Tomoharu FUJIWARA, Nobutaka MAGOME
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Publication number: 20180102324Abstract: A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is formed by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern.Type: ApplicationFiled: December 12, 2017Publication date: April 12, 2018Applicant: NIKON CORPORATIONInventor: Tomoharu FUJIWARA
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Patent number: 9941217Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer; allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.Type: GrantFiled: January 6, 2015Date of Patent: April 10, 2018Assignee: NIKON CORPORATIONInventors: Yuji Shiba, Tomoharu Fujiwara, Nobutaka Magome
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Patent number: 9911701Abstract: A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is formed by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern.Type: GrantFiled: December 29, 2016Date of Patent: March 6, 2018Assignee: NIKON CORPORATIONInventor: Tomoharu Fujiwara
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Patent number: 9871003Abstract: A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is formed by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern.Type: GrantFiled: December 29, 2016Date of Patent: January 16, 2018Assignee: NIKON CORPORATIONInventor: Tomoharu Fujiwara
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Publication number: 20170322496Abstract: A liquid immersion exposure apparatus includes a projection optical system via which exposure light is projected, a first stage that is movable below the projection optical system and having a holding portion that holds a substrate, a second stage that is movable below the projection optical system, and a nozzle member having an opening through which the exposure light is projected, a supply opening via which the liquid is supplied and a first recovery opening via which the liquid is collected. During exposure of the substrate, a portion of a surface of the substrate is covered by the liquid while performing liquid supply from the supply opening and liquid collection from the first recovery opening.Type: ApplicationFiled: July 12, 2017Publication date: November 9, 2017Applicant: NIKON CORPORATIONInventors: Tomoharu FUJIWARA, Yuichi SHIBAZAKI
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Publication number: 20170219931Abstract: A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.Type: ApplicationFiled: April 12, 2017Publication date: August 3, 2017Applicant: Nikon CorporationInventors: Soichi Owa, Yoji Watanabe, Tomoharu Fujiwara
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Patent number: 9709900Abstract: A liquid immersion exposure apparatus includes a projection optical system via which exposure light is projected, a first stage that is movable below the projection optical system and having a holding portion that holds a substrate, a second stage that is movable below the projection optical system, and a nozzle member having an opening through which the exposure light is projected, a supply opening via which the liquid is supplied and a first recovery opening via which the liquid is collected. During exposure of the substrate, a portion of a surface of the substrate is covered by the liquid while performing liquid supply from the supply opening and liquid collection from the first recovery opening. One or both of the first and second stages has a second recovery opening via which the liquid that comes from a gap between the first stage and the second stage is recovered.Type: GrantFiled: November 25, 2014Date of Patent: July 18, 2017Assignee: NIKON CORPORATIONInventors: Tomoharu Fujiwara, Yuichi Shibazaki
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Patent number: 9651871Abstract: A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.Type: GrantFiled: January 29, 2016Date of Patent: May 16, 2017Assignee: Nikon CorporationInventors: Soichi Owa, Yoji Watanabe, Tomoharu Fujiwara
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Publication number: 20170110410Abstract: A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is formed by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern.Type: ApplicationFiled: December 29, 2016Publication date: April 20, 2017Applicant: NIKON CORPORATIONInventor: Tomoharu FUJIWARA
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Patent number: 9618854Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.Type: GrantFiled: May 3, 2016Date of Patent: April 11, 2017Assignee: NIKON CORPORATIONInventors: Kenichi Shiraishi, Ryuichi Hoshika, Tomoharu Fujiwara