Abstract: A substrate support includes a monolithic body. The monolithic body includes a central portion and a peripheral portion. The central portion includes a top surface recessed with respect to the peripheral portion. A shadow ring is configured to sit directly upon an upper surface of the peripheral portion, and overlaps a portion of a substrate positioned upon the central portion. A heating element embedded within the central portion heats the central portion, the peripheral portion, and the shadow ring.

Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.

Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.

Abstract: Embodiments of an electrostatic chuck are provided herein. In some embodiments an electrostatic chuck includes an electrode, a dielectric body having a disk shape and covering the electrode, the dielectric body including a central region and a peripheral region, and the dielectric body including a lower surface having a central opening and an upper surface having a first opening in the central region and a plurality of second openings in the peripheral region, wherein the upper surface includes a plurality of protrusions and a diameter of each of the plurality of second openings is greater than 25.0 mils, and gas distribution channels that extend from the lower surface to the upper surface to define a plenum within the dielectric body.

Abstract: Embodiments of an electrostatic chuck are provided herein. In some embodiments an electrostatic chuck includes an electrode, a dielectric body having a disk shape and covering the electrode, the dielectric body including a central region and a peripheral region, and the dielectric body including a lower surface having a central opening and an upper surface having a first opening in the central region and a plurality of second openings in the peripheral region, wherein the upper surface includes a plurality of protrusions and a diameter of each of the plurality of second openings is greater than 25.0 mils, and gas distribution channels that extend from the lower surface to the upper surface to define a plenum within the dielectric body.

Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a substrate support includes a body having a support surface; an RF electrode disposed in the body proximate the support surface to receive RF current from an RF source; a shaft to support the body; a conductive element having an interior volume and extending through the shaft, wherein the conductive element is coupled to the RF electrode; and an RF gasket; wherein the conductive element includes features that engage the RF gasket to return the RF current to ground.

Abstract: Methods and apparatus for substrate position calibration for substrate supports in substrate processing systems are provided herein. In some embodiments, a method for positioning a substrate on a substrate support includes: obtaining a plurality of backside pressure values corresponding to a plurality of different substrate positions on a substrate support by repeatedly placing a substrate in a position on the substrate support, and vacuum chucking the substrate to the substrate support and measuring a backside pressure; and analyzing the plurality of backside pressure values to determine a calibrated substrate position.

Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a body having a support surface; and a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil vary among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones.

Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a substrate support includes a body having a support surface; an RF electrode disposed in the body proximate the support surface to receive RF current from an RF source; a shaft to support the body; a conductive element having an interior volume and extending through the shaft, wherein the conductive element is coupled to the RF electrode; and an RF gasket; wherein the conductive element includes features that engage the RF gasket to return the RF current to ground.

Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a body having a support surface; and a first heater disposed within the body and having a first heating coil and multiple heating zones, wherein a pitch of windings of the first heating coil vary among each of the multiple heating zones to define a predetermined heating ratio between the multiple heating zones.

Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a first plate for supporting a substrate, the first plate having a plurality of purge gas channels on its backside; a second plate disposed beneath and supporting the first plate; and an edge ring surrounding the first plate and disposed above the second plate, wherein the plurality of purge gas channels extend from a single inlet in a central portion to a plurality of outlets at a periphery of the first plate, and wherein the plurality of purge gas channels have a substantially equal flow conductance.

Abstract: A device is provided in which a video image controller acquires information for a plurality of video images from a video image source, a cursor position controller calculates cursor position information and generates cursor image information, a display image generator synthesizes the plurality of video images and cursor image information and displays the same on a display device, a distance information generator generates distance information based on the video image position information and the cursor position information, and an audio output controller decides volume of audio for the plurality of video images based on this distance information, and outputs to an audio output device.

Abstract: The present invention includes video image control means for acquiring information for a plurality of video images from a video image source, cursor position control means for calculating cursor position information and generating cursor image information, display image generating means for synthesizing a plurality of video images and cursor image information and displaying the same on a display device, distance information generating means for generating distance information based on video image position information and cursor position information, and audio output control means for deciding volume of audio for the plurality of video images based on this distance information, and making output to an audio output device.

Abstract: A communication control method for preventing contention for an originating telephone number among a plurality of terminal devices. A terminal device directly connected with a telephone line is provided with means for setting whether or not to execute an originating telephone number receiving sequence at the terminal device and, when the execution of the originating telephone number receiving sequence is set for the terminal device, the sequence is executed at the device and a connection between the telephone line and the other terminal device is cut off; when the execution of the sequence is not set for the device, the sequence is not executed at the device and the other terminal device is connected with the telephone line to execute the sequence at the connected other device.

Abstract: A communication control method for preventing contention for an originating telephone number among a plurality of terminal devices. A terminal device (3) directly connected with a telephone line is provided with means (11) for setting whether or not to execute an originating telephone number receiving sequence at the terminal device (3) and, when the execution of the originating telephone number receiving sequence is set for the terminal device (3), the sequence is executed at the device (3) and a connection between the telephone line (5) and the other terminal device (4) is cut off; when the execution of the sequence is not set for the device (3), the sequence is not executed at the device (3) and the other terminal device (4) is connected with the telephone line (5) to execute the sequence at the connected other device (4).