Abstract: An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.

Abstract: An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.

Abstract: Apparatus for measuring the distance to an object comprising projection means for projecting a radiation beam onto the object including a radiation generating means and a first optical system, and detection means for detecting the radiation beam reflected from the object including radiation detecting means having a radiation-receiving surface for detecting the intensity distribution of the radiation on said radiation-receiving surface and a second optical system for guiding at least a portion of the reflected radiation beam from the object to said radiation-receiving surface, an optically conjugated relation being held between said radiation-receiving surface and an area of the optical axis of the first optical system.