Patents by Inventor Tomohide Watanabe
Tomohide Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8358340Abstract: A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.Type: GrantFiled: June 3, 2009Date of Patent: January 22, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Ryoji Yoshikawa, Tomohide Watanabe, Hiromu Inoue, Hiroyuki Ikeda, Hiroyuki Tanizaki
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Publication number: 20090303323Abstract: A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.Type: ApplicationFiled: June 3, 2009Publication date: December 10, 2009Inventors: Ryoji Yoshikawa, Tomohide Watanabe, Hiromu Inoue, Hiroyuki Ikeda, Hiroyuki Tanizaki
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Patent number: 7394048Abstract: A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.Type: GrantFiled: February 27, 2007Date of Patent: July 1, 2008Assignees: Kabushiki Kaisha Toshiba, NuFlare Technology, Inc.Inventors: Hiromu Inoue, Tomohide Watanabe, Satoshi Endo, Masami Ikeda
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Publication number: 20080055606Abstract: An apparatus for inspecting a pattern, including: at least one of a first floodlight system for inspection by transmissive light and a second floodlight system for inspection by reflective light; an inspection optical system for capturing an image of the pattern on an object under inspection; and a stage for mounting and moving the object under inspection. The one of the first floodlight system and the second floodlight system includes a diffracted light control means for enhancing light diffracted by the pattern.Type: ApplicationFiled: June 29, 2007Publication date: March 6, 2008Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiromu Inoue, Tomohide Watanabe, Ryoji Yoshikawa
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Publication number: 20070200051Abstract: A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.Type: ApplicationFiled: February 27, 2007Publication date: August 30, 2007Inventors: Hiromu Inoue, Tomohide Watanabe, Satoshi Endo, Masami Ikeda
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Patent number: 5602645Abstract: The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.Type: GrantFiled: September 13, 1995Date of Patent: February 11, 1997Assignees: Kabushiki Kaisha Toshiba, Kabushiki Kaisha TopconInventors: Mitsuo Tabata, Toru Tojo, Kiminobu Akeno, Toshiyuki Watanabe, Tomohide Watanabe, Eiji Yamanaka, Chikara Itoh, Makoto Taya
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Patent number: 5379348Abstract: A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.Type: GrantFiled: March 31, 1993Date of Patent: January 3, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Toshiyuki Watanabe, Hideo Tsuchiya, Toru Tojo, Tomohide Watanabe
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Patent number: 4743768Abstract: A method of measuring non-linearity of a pattern edge of a pattern formed on a metal plate such as a glass plate and an apparatus for measuring the same are disclosed. With this novel pattern edge measurement system, first is to dispose a pattern to be measured so that a photosensitive picture element column in a light-receiving unit is substantially in parallel with a pattern edge of an image of the pattern to effect a relative movement of the light-receiving unit or the image of the pattern so that light-receiving unit traverses the pattern edge. Next is to memorize a signal indicative of a light received by the photosensitive picture element column every predetermined moving distances of the light-receiving unit or the pattern to determine a pattern edge position per each photosensitive picture element by making use of the received light signal. Then, a non-linearity of the pattern is computed on the basis of each pattern edge position.Type: GrantFiled: January 3, 1986Date of Patent: May 10, 1988Assignee: Kabushiki Kaisha ToshibaInventor: Tomohide Watanabe
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Patent number: 4577095Abstract: Disclosed is an automatic focusing apparatus which comprises an objective disposed in opposition to a substrate with patterns formed thereon, a first line sensor disposed at a first focal point of the focal length of the objective, second and third line sensors which are disposed closer to and farther from the objective by a given distance with respect to second and third focal points of the focal length of the objective, first to third differential circuits for differentiating the output signals from the first to third line sensors, a detecting circuit for detecting a displacement of the substrate from a predetermined proper distance between the objective and the substrate on the basis of the output signals from the first to third differential circuits, and a correcting device for correcting the displacement on the basis of the output signal from the detecting circuit. Thus, a single optical system is used for automatically correcting focus and pattern inspection.Type: GrantFiled: March 7, 1983Date of Patent: March 18, 1986Assignee: Tokyo Shibaura Denki Kabushiki KaishaInventor: Tomohide Watanabe
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Patent number: 4230940Abstract: An automatic focusing apparatus includes a lens for leading a laser beam onto a sample surface at a predetermined incident angle, a beam splitter to divide the reflected beam from the sample surface in accordance with the vertical shift thereof, a pair of photo diodes to respectively receive the divided beams and produce electric signals, a differential amplifier to produce a differential signal between the electric signals and a mechanism to vertically shift the stage by means of the differential signal to automatically focus a lens system on said sample surface.Type: GrantFiled: July 14, 1978Date of Patent: October 28, 1980Assignee: Tokyo Shibaura Denki Kabushiki KaishaInventors: Masana Minami, Tomohide Watanabe