Patents by Inventor Tomohiko Akiyama

Tomohiko Akiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220336193
    Abstract: A disclose substrate support of a plasma processing apparatus has an electrostatic chuck that holds an edge ring. The electrostatic chuck includes a first electrode and a second electrode. In an execution period of a first plasma processing on a substrate, first potentials which are ones out of potentials same as each other and potentials different from each other are set to the first and second electrodes, respectively. In an execution period of a second plasma processing on the substrate, second potentials which are others out of the potentials same as each other and the potentials different from each other are set to the first and second electrodes, respectively. The respective potentials of the first electrode and the second electrode are switched from the first potentials to the second potentials.
    Type: Application
    Filed: July 1, 2022
    Publication date: October 20, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Junichi SASAKI, Yasuharu SASAKI, Hidetoshi HANAOKA, Tomohiko AKIYAMA
  • Patent number: 11417500
    Abstract: A disclose substrate support of a plasma processing apparatus has an electrostatic chuck that holds an edge ring. The electrostatic chuck includes a first electrode and a second electrode. In an execution period of a first plasma processing on a substrate, first potentials which are ones out of potentials same as each other and potentials different from each other are set to the first and second electrodes, respectively. In an execution period of a second plasma processing on the substrate, second potentials which are others out of the potentials same as each other and the potentials different from each other are set to the first and second electrodes, respectively. The respective potentials of the first electrode and the second electrode are switched from the first potentials to the second potentials.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: August 16, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Junichi Sasaki, Yasuharu Sasaki, Hidetoshi Hanaoka, Tomohiko Akiyama
  • Publication number: 20210395692
    Abstract: In related-art methods of differentiating pluripotent stem cells into a desired cell type, there has not been established a differentiation induction method using human ES/iPS cells and being stable and highly efficient. A method of inducing differentiation into a desired cell type within a short period of time and with high efficiency by attenuating differentiation resistance of a pluripotent stem cell to generate a pluripotent stem cell that actively proceeds to a differentiated cell type has been found, and thus the present invention has been completed.
    Type: Application
    Filed: September 3, 2021
    Publication date: December 23, 2021
    Applicant: KEIO UNIVERSITY
    Inventors: Minoru Ko, Tomohiko Akiyama
  • Patent number: 11136552
    Abstract: In related-art methods of differentiating pluripotent stem cells into a desired cell type, there has not been established a differentiation induction method using human ES/iPS cells and being stable and highly efficient. A method of inducing differentiation into a desired cell type within a short period of time and with high efficiency by attenuating differentiation resistance of a pluripotent stem cell to generate a pluripotent stem cell that actively proceeds to a differentiated cell type has been found, and thus the present invention has been completed.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: October 5, 2021
    Assignee: KEIO UNIVERSITY
    Inventors: Minoru Ko, Tomohiko Akiyama
  • Publication number: 20210118647
    Abstract: A disclose substrate support of a plasma processing apparatus has an electrostatic chuck that holds an edge ring. The electrostatic chuck includes a first electrode and a second electrode. In an execution period of a first plasma processing on a substrate, first potentials which are ones out of potentials same as each other and potentials different from each other are set to the first and second electrodes, respectively. In an execution period of a second plasma processing on the substrate, second potentials which are others out of the potentials same as each other and the potentials different from each other are set to the first and second electrodes, respectively. The respective potentials of the first electrode and the second electrode are switched from the first potentials to the second potentials.
    Type: Application
    Filed: September 22, 2020
    Publication date: April 22, 2021
    Applicant: Tokyo Electron Limited
    Inventors: Junichi SASAKI, Yasuharu SASAKI, Hidetoshi HANAOKA, Tomohiko AKIYAMA
  • Publication number: 20200048612
    Abstract: In related-art methods of differentiating pluripotent stem cells into a desired cell type, there has not been established a differentiation induction method using human ES/iPS cells and being stable and highly efficient. A method of inducing differentiation into a desired cell type within a short period of time and with high efficiency by attenuating differentiation resistance of a pluripotent stem cell to generate a pluripotent stem cell that actively proceeds to a differentiated cell type has been found, and thus the present invention has been completed.
    Type: Application
    Filed: October 28, 2016
    Publication date: February 13, 2020
    Applicant: KEIO UNIVERSITY
    Inventors: Minoru Ko, Tomohiko Akiyama