Patents by Inventor Tomohiko Doi

Tomohiko Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing semiconductor device
    Patent number: 7829470
    Abstract: A contact hole, after hole etching, is subjected to light etching using a process gas containing a fluorocarbon-based gas and oxygen, with the oxygen being enriched, under condition without applying bias. Then, reaction products (5) having C—F bond and adhered to an interior of a hole (3) are removed using plasma treatment. After that, deposits (4) that have been left at a hole bottom are removed by wet processing. Then, a conductive material is buried in the hole to form a contact plug (7).
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: November 9, 2010
    Assignee: Elpida Memory, Inc.
    Inventor: Tomohiko Doi
  • Method for manufacturing semiconductor device
    Publication number: 20090203207
    Abstract: A contact hole, after hole etching, is subjected to light etching using a process gas containing a fluorocarbon-based gas and oxygen, with the oxygen being enriched, under condition without applying bias. Then, reaction products (5) having C—F bond and adhered to an interior of a hole (3) are removed using plasma treatment. After that, deposits (4) that have been left at a hole bottom are removed by wet processing. Then, a conductive material is buried in the hole to form a contact plug (7).
    Type: Application
    Filed: February 5, 2009
    Publication date: August 13, 2009
    Applicant: Elpida Memory, Inc.
    Inventor: Tomohiko Doi