Patents by Inventor Tomohiko Katoh

Tomohiko Katoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8468693
    Abstract: A dielectric device has a first conductor and a dielectric disposed thereon. An intermediate region is formed between the first conductor and dielectric. In the intermediate region, an additive different from the first conductor and dielectric and the dielectric are mixed with each other. The additive contains at least one element of Si, Al, P, Mg, Mn, Y, V, Mo, Co, Nb, Fe, and Cr.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 25, 2013
    Assignee: TDK Corporation
    Inventors: Tomohiko Katoh, Kenji Horino, Yuko Saya
  • Publication number: 20100323097
    Abstract: A dielectric device has a first conductor and a dielectric disposed thereon. An intermediate region is formed between the first conductor and dielectric. In the intermediate region, an additive different from the first conductor and dielectric and the dielectric are mixed with each other. The additive contains at least one element of Si, Al, P, Mg, Mn, Y, V, Mo, Co, Nb, Fe, and Cr.
    Type: Application
    Filed: August 25, 2010
    Publication date: December 23, 2010
    Applicant: TDK CORPORATION
    Inventors: Tomohiko KATOH, Kenji Horino, Yuko Saya
  • Patent number: 7808769
    Abstract: A dielectric device has a first conductor and a dielectric disposed thereon. An intermediate region is formed between the first conductor and dielectric. In the intermediate region, an additive different from the first conductor and dielectric and the dielectric are mixed with each other. The additive contains at least one element of Si, Al, P, Mg, Mn, Y, V, Mo, Co, Nb, Fe, and Cr.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: October 5, 2010
    Assignee: TDK Corporation
    Inventors: Tomohiko Katoh, Kenji Horino, Yuko Saya
  • Patent number: 7581311
    Abstract: A method for manufacturing a dielectric element including the steps of: preparing a lower electrode; forming a dielectric on the lower electrode to fabricate a first laminated structure; annealing the first laminated structure; forming an upper electrode on a dielectric film to fabricate a second laminated structure; and annealing the second laminated structure under a reduced pressure atmosphere at a temperature of 150° C. or higher.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: September 1, 2009
    Assignee: TDK Corporation
    Inventors: Tomohiko Katoh, Kenji Horino
  • Publication number: 20070236866
    Abstract: A method for manufacturing a dielectric element including the steps of: preparing a lower electrode; forming a dielectric on the lower electrode to fabricate a first laminated structure; annealing the first laminated structure; forming an upper electrode on a dielectric film to fabricate a second laminated structure; and annealing the second laminated structure under a reduced pressure atmosphere at a temperature of 150° C. or higher.
    Type: Application
    Filed: November 22, 2006
    Publication date: October 11, 2007
    Applicant: TDK CORPORATION
    Inventors: Tomohiko Katoh, Kenji Horino
  • Publication number: 20070138128
    Abstract: A dielectric device has a first conductor and a dielectric disposed thereon. An intermediate region is formed between the first conductor and dielectric. In the intermediate region, an additive different from the first conductor and dielectric and the dielectric are mixed with each other. The additive contains at least one element of Si, Al, P, Mg, Mn, Y,V,Mo, Co, Nb, Fe, and Cr.
    Type: Application
    Filed: December 13, 2006
    Publication date: June 21, 2007
    Applicant: TDK CORPORATION
    Inventors: Tomohiko Katoh, Kenji Horino, Yuko Saya