Patents by Inventor Tomohiro HIGASHI

Tomohiro HIGASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water-repellent composition
    Patent number: 11982048
    Abstract: A water repellent composition containing: (A) water repellent particles in which the number of surface alkyl groups on the water repellent particles is 600×1018-50,000×1018 per 1 g of water repellent particles; (B) a water-repellent resin which is a polymer having a long-chain C7-40 hydrocarbon group; and (C) a liquid medium. The water-repellent particles preferably have an average primary particle size of 1-100 nm. Also disclosed is a method for treating a fiber using the water repellent composition, a method for producing a treated textile product, a film formed from the water repellent composition, and a textile product treated with a treatment liquid containing the water-repellent composition.
    Type: Grant
    Filed: June 25, 2021
    Date of Patent: May 14, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yoshito Tanaka, Rena Inamasu, Yuko Shiotani, Shouta Shibutani, Masahiro Higashi, Tomohiro Yoshida, Norimasa Uesugi
  • TRANSPARENT ELECTRODE FOR OXYGEN PRODUCTION, METHOD FOR PRODUCING SAME, TANDEM WATER DECOMPOSITION REACTION ELECTRODE PROVIDED WITH SAME, AND OXYGEN PRODUCTION DEVICE USING SAME
    Publication number: 20220090278
    Abstract: A method foe producing a transparent electrode for oxygen production having a Ta nitride layer on a transparent substrate, including: a step of forming a Ta nitride precursor layer on the transparent substrate; and a step of nitriding the Ta nitride precursor layer with a mixed gas containing ammonia and a carrier gas.
    Type: Application
    Filed: December 7, 2021
    Publication date: March 24, 2022
    Applicants: Mitsubishi Chemical Corporation, THE UNIVERSITY OF TOKYO, JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroshi NISHIYAMA, Tomohiro HIGASHI, Yutaka SASAKI, Taro YAMADA, Kazunari DOMEN, Yohichi SUZUKI, Seiji AKIYAMA
  • Transparent electrode for oxygen production, method for producing same, tandem water decomposition reaction electrode provided with same, and oxygen production device using same
    Patent number: 11248304
    Abstract: A method for producing a transparent electrode for oxygen production having a Ta nitride layer on a transparent substrate, including: a step of forming a Ta nitride precursor layer on the transparent substrate; and a step of nitriding the Ta nitride precursor layer with a mixed gas containing ammonia and a carrier gas.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: February 15, 2022
    Assignees: Mitsubishi Chemical Corporation, THE UNIVERSITY OF TOKYO, JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroshi Nishiyama, Tomohiro Higashi, Yutaka Sasaki, Taro Yamada, Kazunari Domen, Yohichi Suzuki, Seiji Akiyama
  • TRANSPARENT ELECTRODE FOR OXYGEN PRODUCTION, METHOD FOR PRODUCING SAME, TANDEM WATER DECOMPOSITION REACTION ELECTRODE PROVIDED WITH SAME, AND OXYGEN PRODUCTION DEVICE USING SAME
    Publication number: 20200173044
    Abstract: A method for producing a transparent electrode for oxygen production having a Ta nitride layer on a transparent substrate, including: a step of forming a Ta nitride precursor layer on the transparent substrate; and a step of nitriding the Ta nitride precursor layer with a mixed gas containing ammonia and a carrier gas.
    Type: Application
    Filed: February 7, 2020
    Publication date: June 4, 2020
    Applicants: Mitsubishi Chemical Corporation, THE UNIVERSITY OF TOKYO, JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hiroshi NISHIYAMA, Tomohiro HIGASHI, Yutaka SASAKI, Taro YAMADA, Kazunari DOMEN, Yohichi SUZUKI, Seiji AKIYAMA