Patents by Inventor Tomohiro KATAMURA

Tomohiro KATAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230244145
    Abstract: A polysiloxane that has a fast polymerization reaction rate and good storage stability is provided. Alternatively, a silicon-containing monomer mixture as a raw material of the polysiloxane, a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane are provided. Alternatively, the present invention provides a production method for a resin composition, a photosensitive resin composition, a cured film, or a patterned cured film containing the polysiloxane. A mixture is provided including a first monomer containing silicon represented by the following general formula (X); and a second monomer containing silicon represented by the following general formula (Y). In the case where A is set to a contained amount of the first monomer containing silicon and B is set to a contained amount of the second monomer containing silicon, the following relationship is satisfied. B / A + B ? > ? 0 .
    Type: Application
    Filed: March 15, 2023
    Publication date: August 3, 2023
    Inventors: Takashi MASUBUCHI, Tomohiro KATAMURA, Kazuhiro YAMANAKA
  • Publication number: 20210395461
    Abstract: Provided is a polysiloxane composition containing a polysiloxane compound including a constitutional unit represented by Formula (1) and at least one of a constitutional unit of Formula (2) and a constitutional unit of Formula (3), and a solvent. [(Rx)bR1mSiOn/2]??(1) [(Ry)cR2pSiOq/2]??(2) [SiO4/2]??(3) Here, Rx is a monovalent group represented by Formula (1a) (X is a hydrogen atom or an acid-labile group, a is an integer of 1 to 5, and a broken line represents a bond), Ry is a monovalent organic group having 1 to 30 carbon atoms, which contains any one of an epoxy group, an oxetane group, an acryloyl group, and a methacryloyl group.
    Type: Application
    Filed: October 28, 2019
    Publication date: December 23, 2021
    Inventors: Yutaka SUGITA, Tomohiro KATAMURA, Junya NAKATSUJI, Kazuhiro YAMANAKA, Takashi MASUBUCHI
  • Publication number: 20210061827
    Abstract: Provided is a production method for producing an aromatic alkoxysilane containing a hexafluoropropanol group (—C(CF3)2OH; referred to as HFIP group) from an inexpensive starting raw material with a high reaction conversion rate and selectivity. As shown in the following scheme, the production method includes: a first step of reacting an aromatic halosilane with hexafluoroacetone in the presence of a Lewis acid catalyst, thereby obtaining a HFIP group-containing aromatic halosilane; and a second step of forming the HFIP group-containing aromatic alkoxysilane by reacting the HFIP group-containing aromatic halosilane with an alcohol.
    Type: Application
    Filed: February 21, 2019
    Publication date: March 4, 2021
    Inventors: Junya NAKATSUJI, Tomohiro KATAMURA, Yutaka SUGITA, Kazuhiro YAMANAKA