Patents by Inventor Tomohiro Mito

Tomohiro Mito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CONDUCTIVE FILM FORMING METHOD, COPPER PARTICULATE DISPERSION AND CIRCUIT BOARD
    Publication number: 20140216799
    Abstract: An object is to provide a conductive film forming method which can form a conductive film having low electric resistance on a base material by utilizing photo sintering even when the base material has low heat resistance. A conductive film forming method is a method in which a conductive film is formed on a base material, and the method includes the steps of forming a film composed of copper particulates on a base material, subjecting the film to photo sintering, and applying plating to the photo-sintered film. Whereby, it is possible to form a conductive film on a base material by lowering irradiation energy of light in photo sintering even when the base material has low heat resistance. Since the conductive film includes a plated layer, electric resistance decreases.
    Type: Application
    Filed: August 13, 2012
    Publication date: August 7, 2014
    Applicants: APPLIED NANOTECH HOLDINGS, INC., ISHIHARA CHEMICAL CO., LTD.
    Inventors: Yuichi Kawato, Tomohiro Mito, Yusuke Maeda, Tomio Kudo