Abstract: A transparent electrically conductive film includes a transparent substrate, a cured resin layer, and a transparent electrically conductive layer in order. The transparent electrically conductive layer has film density of below 6.85 g/cm3.

Abstract: A transparent electrically conductive film 1 sequentially includes a transparent substrate 2 and an electrically conductive layer 3 toward one side in a thickness direction. The electrically conductive layer 3 includes a visible region 10 and a frame region 11 disposed in a peripheral edge portion of the visible region 10. The visible region 10 includes a transparent electrically conductive layer 4. The frame region 11 includes a conductive layer 5, the transparent electrically conductive layer 4, and an electrically conductive adhesive layer 6 disposed therebetween for achieving adhesion of the conductive layer 5 to the transparent electrically conductive layer 4. The transparent electrically conductive layer 4 includes a metal nanowire.

Abstract: A translucent conductive film includes a film substrate, a metal wiring layer provided as a pattern, and a colored layer. The film substrate has a plurality of protrusions on a surface at a side where the metal wiring layer is provided. The metal wiring layer has a line width of greater than 5 ?m but less than 8 ?m, and the metal wiring layer having a thickness of greater than or equal to 0.1 ?m but less than 0.5 ?m. The colored layer is provided on a main surface of the metal wiring layer at a viewing side but not on a side surface of the metal wiring layer.

Abstract: To provide a touch senor having an improved productivity, and also achieving high reliability since there is no occurrence of a wire break in a metal wiring and having good usability since the metal wiring layer is less likely to be visually recognized. A touch senor of the present invention includes a film substrate (11) having a plurality of protrusions on both surfaces (11a), (11b) thereof, a metal wiring layer (12) provided over one surface (11a) of the film substrate, a circular polarizer film (14) provided at a viewing side A of film substrate (11), and a metal wiring layer (15) provided over the other surface (11b) of the film substrate (11). The metal wiring layer (12) has a line width of greater than 5 ?m but less than or equal to 8 ?m, and a thickness of greater than or equal to 0.1 ?m but less than 0.5 ?m.

Abstract: A transparent conductive film includes a film base, and a polycrystalline layer of indium tin oxide formed on the film base. The polycrystalline layer has a gradient of a concentration of tin oxide in a thickness direction thereof. A maximum value of the concentration of tin oxide in the thickness direction of the polycrystalline layer is 6 wt % to 12 wt %. The polycrystalline layer has a thickness of 10 nm to 35 nm. An average value of maximum sizes of crystal grains composing the polycrystalline layer is 380 nm to 730 nm.

Abstract: A translucent conductive film includes a film substrate, a metal wiring layer provided as a pattern, and a colored layer. The film substrate has a plurality of protrusions on a surface at a side where the metal wiring layer is provided. The metal wiring layer has a line width of greater than 5 ?m but less than 8 ?m, and the metal wiring layer having a thickness of greater than or equal to 0.1 ?m but less than 0.5 ?m. The colored layer is provided on a main surface of the metal wiring layer at a viewing side but not on a side surface of the metal wiring layer.

Abstract: A touch sensor includes a film substrate having a plurality of protrusions on both surfaces thereof, a first metal wiring layer provided as a pattern over a surface at a viewing side of the film substrate, a circular polarizer film laminated at a viewing side of the first metal wiring layer, and a second metal wiring layer provided as a pattern over a surface at a side opposite to the viewing side of the film substrate. Each of the first and second metal wiring layers has a line width of greater than 5 ?m but less than 8 ?m, and each of the first and second metal wiring layers has a thickness of greater than or equal to 0.1 ?m but less than 0.5 ?m.

Abstract: A transparent conductive film includes a film base, and a polycrystalline layer of indium tin oxide formed on the film base. The polycrystalline layer has a gradient of a density of tin oxide in a thickness direction thereof. A maximum value of the density of tin oxide in the thickness direction of the polycrystalline layer is 6 wt % to 12 wt %. The polycrystalline layer has a thickness of 10 nm to 35 nm. An average value of maximum sizes of crystal grains composing the polycrystalline layer is 380 nm to 730 nm.