Patents by Inventor Tomohiro TAMORI
Tomohiro TAMORI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20220260930Abstract: A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.Type: ApplicationFiled: April 29, 2022Publication date: August 18, 2022Inventors: Takuma Yamamoto, Hiroya Ohta, Kenji Tanimoto, Yusuke Abe, Tomohiro Tamori, Masaaki Nojiri
-
Patent number: 11353798Abstract: The present invention has a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device has a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.Type: GrantFiled: October 13, 2017Date of Patent: June 7, 2022Assignee: Hitachi High-Technologies CorporationInventors: Takuma Yamamoto, Hiroya Ohta, Kenji Tanimoto, Yusuke Abe, Tomohiro Tamori, Masaaki Nojiri
-
Publication number: 20210055098Abstract: Overlay shift amount measurement with high accuracy becomes possible. A charged particle beam system includes a computer system that measures an overlay shift amount between a first layer of a sample and a second layer lower than the first layer based on output of a detector. The computer system generates first images with respect to the first layer and second images with respect to the second layer based on the output of the detector, generates a first added image by adding the first images by a first added number of images, and generates a second added image by adding the second image by a second added number of images greater than the first added number of images. An overlay shift amount between the first layer and the second layer is measured based on the first added image and the second added image.Type: ApplicationFiled: May 29, 2020Publication date: February 25, 2021Inventors: Takuma YAMAKI, Takuma YAMAMOTO, Yasunori GOTO, Tomohiro TAMORI, Kazunari ASAO
-
Patent number: 10816332Abstract: The purpose of the present invention is to provide a pattern measurement device that is capable of highly accurately measuring a groove bottom, hole bottom, or the like, regardless of the accuracy of the formation of a deep groove or deep hole. To that end, the present invention proposes a pattern measurement device provided with a computation device for measuring the dimensions of a pattern formed on a sample on the basis of a signal obtained by a charged particle beam device, wherein the computation device determines the deviation between a first part of the pattern and a second part of the pattern at a different height than the first part and pattern dimension values on the basis of a detection signal obtained on the basis of the scanning of the sample by a charged particle beam and corrects the pattern dimension values using the deviation determined from the detection signal and relationship information indicating the relationship between the pattern dimensions and the deviation.Type: GrantFiled: April 13, 2016Date of Patent: October 27, 2020Assignee: Hitachi High-Tech CorporationInventors: Hiroya Ohta, Kenji Tanimoto, Tomohiro Tamori, Takuma Yamamoto
-
Publication number: 20200292308Abstract: The purpose of the present invention is to provide a pattern measurement device that is capable of highly accurately measuring a groove bottom, hole bottom, or the like, regardless of the accuracy of the formation of a deep groove or deep hole. To that end, the present invention proposes a pattern measurement device provided with a computation device for measuring the dimensions of a pattern formed on a sample on the basis of a signal obtained by a charged particle beam device, wherein the computation device determines the deviation between a first part of the pattern and a second part of the pattern at a different height than the first part and pattern dimension values on the basis of a detection signal obtained on the basis of the scanning of the sample by a charged particle beam and corrects the pattern dimension values using the deviation determined from the detection signal and relationship information indicating the relationship between the pattern dimensions and the deviation.Type: ApplicationFiled: April 13, 2016Publication date: September 17, 2020Applicant: Hitachi High-Technologies CorporationInventors: Hiroya OHTA, Kenji TANIMOTO, Tomohiro TAMORI, Takuma YAMAMOTO
-
Publication number: 20200278615Abstract: The present invention comprises a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device comprises a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights on the basis of an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.Type: ApplicationFiled: October 13, 2017Publication date: September 3, 2020Inventors: Takuma YAMAMOTO, Hiroya OHTA, Kenji TANIMOTO, Yusuke ABE, Tomohiro TAMORI, Masaaki NOJIRI
-
Patent number: 10141159Abstract: A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image.Type: GrantFiled: January 17, 2014Date of Patent: November 27, 2018Assignee: Hitachi High-Technologies CorporationInventors: Ayumi Doi, Tomohiro Funakoshi, Takuma Yamamoto, Tomohiro Tamori, Tsunehiro Sakai
-
Publication number: 20150371816Abstract: A sample observation device of the invention includes: a charged particle optical column for irradiating a sample with charged particle beams at a first acceleration voltage, the sample having a target part to be observed which is a concave part; an image acquisition part for acquiring an image including the target part to be observed on the basis of signals obtained by irradiation with the charged particle beams; a memory part for memorizing in advance, at each of a plurality of acceleration voltages, information indicating a relationship between a brightness ratio of a concave part to a periphery part of the concave part in a standard sample and a value indicating a structure of the concave part in the standard sample; and an operation part for obtaining a brightness ratio of the concave part to a periphery part of the concave part in the image.Type: ApplicationFiled: January 17, 2014Publication date: December 24, 2015Inventors: Ayumi DOI, Tomohiro FUNAKOSHI, Takuma YAMAMOTO, Tomohiro TAMORI, Tsunehiro SAKAI