Patents by Inventor Tomohiro Yuuki

Tomohiro Yuuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pyrogenic wet thermal oxidation of semiconductor wafers
    Patent number: 5810929
    Abstract: An oxidizing gas containing water vapor generated by hydrogen combustion is introduced from an external gas burner via gas supply pipes into the upper space of a process tube surrounded by a heater, and exhausted from the lower part of the process tube. Until the flame of hydrogen burnt in the external gas burner becomes stable, a dilute gas such as N.sub.2 is introduced into the upper space of the process tube via other gas supply pipes so as to suppress the initial oxidation. Suppressing the initial oxidation may also be performed by bypassing an oxidizing gas from the external gas burner to an exhaust system while introducing a non-oxidizing gas such as N.sub.2 into the upper space of the process tube.
    Type: Grant
    Filed: July 31, 1996
    Date of Patent: September 22, 1998
    Assignee: Yamaha Corporation
    Inventor: Tomohiro Yuuki
  • Semiconductor device wired with fuse
    Patent number: 5741731
    Abstract: A method of manufacturing a semiconductor device including the steps of: forming an insulating film on an electrical connection area; forming a contact hole in the insulating film; forming a crystalline semiconductor region in the contact hole; forming a wiring layer covering the contact hole; and selectively implanting ions over the wiring layer by using a resist mask to make the crystalline semiconductor region have a high resistance. A semiconductor device having customized wiring connections can be manufactured in a short term.
    Type: Grant
    Filed: December 11, 1995
    Date of Patent: April 21, 1998
    Assignee: Yamaha Corporation
    Inventor: Tomohiro Yuuki
  • Pyrogenic wet thermal oxidation of semiconductor wafers
    Patent number: 5633212
    Abstract: An oxidizing gas containing water vapor generated by hydrogen combustion is introduced from an external gas burner via gas supply pipes into the upper space of a process tube surrounded by a heater, and exhausted from the lower part of the process tube. Until the flame of hydrogen burnt in the external gas burner becomes stable, a dilute gas such as N.sub.2 is introduced into the upper space of the process tube via other gas supply pipes so as to suppress the initial oxidation. Suppressing the initial oxidation may also be performed by bypassing an oxidizing gas from the external gas burner to an exhaust system while introducing a non-oxidizing gas such as N.sub.2 into the upper space of the process tube.
    Type: Grant
    Filed: July 22, 1994
    Date of Patent: May 27, 1997
    Assignee: Yamaha Corporation
    Inventor: Tomohiro Yuuki
  • Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
    Patent number: 5618349
    Abstract: A process tube is surrounded by a heater. A number of gas inlet holes and a number of gas outlet holes are formed in the side wall of the process tube, the gas inlet and outlet holes facing each other and formed distributed in the longitudinal direction of the process tube. An oxidizing gas is supplied from a gas supply pipe to the gas inlet holes, and exhausted to a gas exhaust pipe via the gas outlet holes or lower gas outlet holes.
    Type: Grant
    Filed: July 22, 1994
    Date of Patent: April 8, 1997
    Assignee: Yamaha Corporation
    Inventor: Tomohiro Yuuki