Patents by Inventor Tomohisa Iinuma

Tomohisa Iinuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9849449
    Abstract: The amorphous inorganic anion exchanger of the present invention is represented by Formula (1) and has an average primary particle size observed with an electron microscope of at least 1 nm but no greater than 500 nm and an NO3 content of no greater than 1 wt % of the whole: BiO(OH)??Formula (1).
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: December 26, 2017
    Assignee: TOAGOSEI CO., LTD.
    Inventors: Kentarou Miyamura, Tomohisa Iinuma, Yasuharu Ono
  • Publication number: 20150321189
    Abstract: The object is to provide an amorphous inorganic anion exchanger having excellent anion exchangeability and suppressed corrosivity toward metals and to provide a production process that can produce an amorphous bismuth compound having excellent anion exchangeability and suppressed corrosivity toward metals. The amorphous inorganic anion exchanger of the present invention is represented by Formula (1) and has an average primary particle size observed with an electron microscope of at least 1 nm but no greater than 500 nm and an NO3 content of no greater than 1 wt % of the whole. The process for producing an amorphous bismuth compound of the present invention includes a precipitate formation step of forming a precipitate by subjecting an acidic aqueous solution containing trivalent Bi ions to a temperature in the range of higher than 0° C. but less than 20° C.
    Type: Application
    Filed: June 13, 2013
    Publication date: November 12, 2015
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Kentarou MIYAMURA, Tomohisa IINUMA, Yasuharu ONO
  • Patent number: 5073580
    Abstract: An epoxy resin composition for use in sealing semiconductors, having enhanced moisture resistance reliability is disclosed, which comprises an epoxy resin and an oxyacid bismuth oxyhydroxide represented by the following formula (1):Bi.sub.x O.sub.y (OH).sub.p (Y.sup.-a).sub.q (NO.sub.3).sub.r.nH.sub.2 O (1)wherein Y.sup.-a represents a residue of an oxyacid other than nitrate; a represents the ionic valence, absolute value, of the residue of the oxyacid; and x, y, p, q, r and n each represents a value satisfying the following:1.ltoreq.x 1.ltoreq.y O.ltoreq.n0.08 x.ltoreq.p.ltoreq.0.92 x0.02 x.ltoreq.aq.ltoreq.0.92 x0.ltoreq.r.ltoreq.0.
    Type: Grant
    Filed: October 29, 1990
    Date of Patent: December 17, 1991
    Assignee: Toagosei Chemical Industry Co., Ltd.
    Inventors: Tomohisa Iinuma, Noriyuki Yamamoto, Hideki Kato