Abstract: A cured-film formation composition for forming a cured film having photoreaction efficiency and solvent resistance, and high adhesiveness alignment uniformity, and an orientation material for photo-alignment, and a retardation material formed by use of the orientation material. A cured-film formation composition includes (A) a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; (B) a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and (C) a polymer obtained by polymerizing a monomer including an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound, and optionally further a cross-linking catalyst as a component (D). By use of the composition, a cured-film is formed and an orientation material is formed by utilizing photo-alignment technique.

Abstract: There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material.

Abstract: There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material. The cured-film formation composition comprises a component (A) that is a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, anvil an amino group, a component (B) that is a hydrophilic polymer having one or more substituents selected from to hydroxy group, a carboxy group, and an amino group; and a component (C) that is cross-linking agent that reacts with the component (A) and the component (B) and reacts at a temperature lower than a sublimation temperature of the component (A), wherein when the component (B) is an acrylic polymer, the cured-film formation composition further comprises a component (E) that is an adhesion enhancing component.

Abstract: A cured-film formation composition for forming a cured film having photoreaction efficiency and solvent resistance, and high adhesiveness alignment uniformity, and an orientation material for photo-alignment, and a retardation material formed by use of the orientation material. A cured-film formation composition includes (A) a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; (B) a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and (C) a polymer obtained by polymerizing a monomer including an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound, and optionally further a cross-linking catalyst as a component (D). By use of the composition, a cured-film is formed and an orientation material is formed by utilizing photo-alignment technique.

Abstract: There is provided a cured-film formation composition for providing an orientation material that has high photoreaction efficiency and excellent solvent resistance with adhesion durability, and that enables a polymerizable liquid crystal to be aligned even on a resin film in a highly sensitive manner. A cured-film formation composition including: (A) an acrylic polymer having a photo-aligning group; (B) a polymer having any one of a hydroxy group, a carboxy group, and an amino group on at least two terminals of a group bonded to a main chain; and (C) a cross-linking agent. An orientation material and a retardation material are obtained with the cured-film formation composition.

Abstract: Provided is an image-capturing unit including an image-capturing chip that includes a first surface having a pixel and a second surface that is on an opposite side of the first surface and has provided thereon an output section that outputs a pixel signal read from the pixel; a transparent substrate that is arranged facing the first surface and includes a wire pattern; a mounting substrate that is arranged facing the second surface and supports the image-capturing chip; and a relay section that is arranged on the mounting substrate and relays, to the wire pattern, the pixel signal output from the output section. Also provided is an image-capturing apparatus including the image-capturing unit described above.

Abstract: A cured-film formation composition for forming a cured film having photoreaction efficiency and solvent resistance, and high adhesiveness alignment uniformity, and an orientation material for photo-alignment, and a retardation material formed by use of the orientation material. A cured-film formation composition includes (A) a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; (B) a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and (C) a polymer obtained by polymerizing a monomer including an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound, and optionally further a cross-linking catalyst as a component (D). By use of the composition, a cured-film is formed and an orientation material is formed by utilizing photo-alignment technique.

Abstract: There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material.

Abstract: There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.

Abstract: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.

Abstract: It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.

Abstract: It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser, and enabling the formation of a resist pattern having a desired shape. When the composition is produced or used, it is required that odor due to a raw material monomer causes no problem. The object is solved by a resist underlayer film forming composition for lithography containing a polymer having in backbone thereof, a disulfide bond (S—S bond), and a solvent. The polymer may be a product of a reaction between at least one type of compound (diepoxy compound) containing two epoxy groups and at least one type of dicarboxylic acid containing a disulfide bond.

Abstract: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.

Abstract: There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.

Abstract: A solid-state image sensor of the present invention has a plurality of pixel cells that generate signal charges in accordance with incident light. It is characterized by having a gettering region within the area of a pixel cell. The gettering region, which is disposed closely to the photoelectrical conversion layer, makes direct and efficient use of gettering capability in the pixel region in the solid-state image sensor. As a result, it is possible to effectively eliminate metal contaminant contained in the pixel region, thereby remarkably reducing dark outputs occurring from the metal contaminant.

Abstract: A buckle, which comprises a female body and a male body, which may be inserted each other and prevents rocking in right and left directions and clattering of the female body and the male body at the time, is provided. A buckle comprising a female body formed with a flat housing and a male body having a pair of right and left flexible insertion legs, wherein when the female body and the male body are inserted to engage, the butting surfaces between the female body and the male body on a plane, that is, butting portions are formed with horizontal straight portions on both sides of the butting portions as well as a concave portion at the center in female body and a convex portion in the male body, or a convex portion in the female body and a concave portion in the male body continuously formed, so as to join the female body to the male body in the condition closely in contact.

Abstract: A resin safety shoe toe cap made from a fiber-reinforced thermoplastic resin, wherein the toe cap resin safety shoe toe cap is constituted from rising parts comprising a front end rising part 1, a big toe side rising part 2 and a little toe side rising part 3; a top part 6; and a base part 5, wherein the thickness of the big toe side rising part 2 is made to be greater than the thickness of the little toe side rising part 3. Moreover, the big toe side rising part 2 and the little toe side rising part 3 are connected to the front end rising part 1 by curved surface parts 4 having different curvatures, and the rising parts are formed so as to rise up approximately perpendicularly to the base part 5. The safety shoe toe cap not only satisfies the performances in L-class and S-class of JIS T 8101, but also the impact resistance and compression resistance performances stipulated in H-class of JIS T 8101 and safety shoe standards in the CEN Standard, without impairing the ability to fit to shoes and wearer's feet.

Abstract: A solid-state image sensor of the present invention has a plurality of pixel cells that generate signal charges in accordance with incident light. It is characterized by having a gettering region within the area of a pixel cell. The gettering region, which is disposed closely to the photoelectrical conversion layer, makes direct and efficient use of gettering capability in the pixel region in the solid-state image sensor. As a result, it is possible to effectively eliminate metal contaminant contained in the pixel region, thereby remarkably reducing dark outputs occurring from the metal contaminant.

Abstract: A resin safety shoe toe cap made from a fiber-reinforced thermoplastic resin, wherein the toe cap resin safety shoe toe cap is constituted from rising parts comprising a front end rising part 1, a big toe side rising part 2 and a little toe side rising part 3; a top part 6; and a base part 5, wherein the thickness of the big toe side rising part 2 is made to be greater than the thickness of the little toe side rising part 3. Moreover, the big toe side rising part 2 and the little toe side rising part 3 are connected to the front end rising part 1 by curved surface parts 4 having different curvatures, and the rising parts are formed so as to rise up approximately perpendicularly to the base part 5. The safety shoe toe cap not only satisfies the performances in L-class and S-class of JIS T 8101, but also the impact resistance and compression resistance performances stipulated in H-class of JIS T 8101 and safety shoe standards in the CEN Standard, without impairing the ability to fit to shoes and wearer's feet.