Patents by Inventor Tomokazu Shimakura
Tomokazu Shimakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210370094Abstract: A radiation therapy apparatus that enhances the reliability and ease of use of a treatment is provided. A radiation therapy apparatus includes: a treatment bed moving a top plate with an object to be treated Pt placed on the top plate to a predetermined treatment location; an imaging apparatus moving to the predetermined treatment location from a direction different from the direction of movement of the top plate and picking up an image of the object to be treated; and an irradiation apparatus provided between the treatment bed and the imaging apparatus, extensible, and applying a radioactive ray to the object to be treated. When the CT apparatus moves to the treatment location, the irradiation apparatus moves to a predetermined waiting position P1. When applying a radioactive ray to an object to be treated, the irradiation apparatus moves to a predetermined irradiation position P3.Type: ApplicationFiled: October 24, 2019Publication date: December 2, 2021Inventors: Taizo HONDA, Tatsuya FUJISAWA, Chihiro NAKASHIMA, Tomokazu SHIMAKURA
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Patent number: 11058894Abstract: To provide a particle beam therapy device that expands an irradiation field while avoiding an increase in size of a scanning unit or an irradiation device including the scanning unit. A shift unit 36 is provided downstream of a scanning unit 34. The shift unit 36 deflects a carbon beam as a particle beam to shift the irradiation field, thereby forming an expanded irradiation field. The shift unit 36 includes a first shift electromagnet 42 that shifts the irradiation field in a Y direction and a second shift electromagnet 44 that shifts the irradiation field in an X direction. The scanning unit is dynamically controlled, and the shift unit 36 is statically controlled.Type: GrantFiled: November 6, 2019Date of Patent: July 13, 2021Assignee: HITACHI, LTD.Inventors: Tomokazu Shimakura, Chihiro Nakashima, Satoshi Totake, Kazuo Tomida, Takeshi Fujita
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Publication number: 20200261745Abstract: To provide a particle beam therapy device that expands an irradiation field while avoiding an increase in size of a scanning unit or an irradiation device including the scanning unit. A shift unit 36 is provided downstream of a scanning unit 34. The shift unit 36 deflects a carbon beam as a particle beam to shift the irradiation field, thereby forming an expanded irradiation field. The shift unit 36 includes a first shift electromagnet 42 that shifts the irradiation field in a Y direction and a second shift electromagnet 44 that shifts the irradiation field in an X direction. The scanning unit is dynamically controlled, and the shift unit 36 is statically controlled.Type: ApplicationFiled: November 6, 2019Publication date: August 20, 2020Inventors: Tomokazu SHIMAKURA, Chihiro NAKASHIMA, Satoshi TOTAKE, Kazuo TOMIDA, Takeshi FUJITA
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Patent number: 9773640Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.Type: GrantFiled: July 28, 2015Date of Patent: September 26, 2017Assignee: Hitachi, Ltd.Inventors: Tomokazu Shimakura, Yoshio Takahashi, Hideo Kashima
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Publication number: 20160035535Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.Type: ApplicationFiled: July 28, 2015Publication date: February 4, 2016Inventors: Tomokazu SHIMAKURA, Yoshio TAKAHASHI, Hideo KASHIMA
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Patent number: 9070532Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: GrantFiled: April 24, 2014Date of Patent: June 30, 2015Assignee: Hitachi, Ltd.Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Publication number: 20140319371Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: ApplicationFiled: April 24, 2014Publication date: October 30, 2014Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Patent number: 8766185Abstract: The charged particle beam device has an unlimitedly rotatable sample stage and an electric field control electrode for correcting electric field distortion at a sample peripheral part. A voltage is applied to a sample on the unlimitedly rotatable sample stage through a retarding electrode that is in contact with a holder receiver at a rotation center of a rotary stage. An equipotential plane on the electric field control electrode is varied by applying a voltage to the electric field control electrode, and following this the equipotential plane at a sample edge is corrected, which enables the sample to be observed as far as its edge.Type: GrantFiled: January 15, 2010Date of Patent: July 1, 2014Assignee: Hitachi, Ltd.Inventors: Tomokazu Shimakura, Masaki Hasegawa
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Patent number: 8410438Abstract: A charged particle beam device has a tilt detection unit that detects a tilt of a sample surface and an E×B deflector in which an electric field and a magnetic field are overlapped with each other and which causes, according to the detected tilt of the sample surface, the sample surface to be perpendicularly irradiated with an irradiation charged particle beam while, at the same time, aligning the trajectory of the charged particle beam with the optical axis centers of an irradiation optical system and an imaging optical system; thereby, the charged particle beam device can prevent problems possibly occurring in cases where a sample stage is tilted or a sample surface is undulating and can enable an accurate image to be acquired.Type: GrantFiled: May 3, 2011Date of Patent: April 2, 2013Assignee: Hitachi, Ltd.Inventors: Tomokazu Shimakura, Masaki Hasegawa
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Publication number: 20110284746Abstract: A charged particle beam device has a tilt detection unit that detects a tilt of a sample surface and an E×B deflector in which an electric field and a magnetic field are overlapped with each other and which causes, according to the detected tilt of the sample surface, the sample surface to be perpendicularly irradiated with an irradiation charged particle beam while, at the same time, aligning the trajectory of the charged particle beam with the optical axis centers of an irradiation optical system and an imaging optical system; thereby, the charged particle beam device can prevent problems possibly occurring in cases where a sample stage is tilted or a sample surface is undulating and can enable an accurate image to be acquired.Type: ApplicationFiled: May 3, 2011Publication date: November 24, 2011Applicant: HITACHI, LTD.Inventors: Tomokazu SHIMAKURA, Masaki HASEGAWA
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Publication number: 20100181480Abstract: According to the present invention, a charged particle beam device has an unlimitedly rotatable sample stage and an electric field control electrode for correcting electric field distortion at a sample peripheral part. A voltage is applied to a sample on the unlimitedly rotatable sample stage through a retarding electrode that is in contact with a holder receiver at a rotation center of a rotary stage. An equipotential plane on the electric field control electrode is varied by applying a voltage to the electric field control electrode, and following this the equipotential plane at a sample edge is corrected, which enables the sample to be observed as far as its edge.Type: ApplicationFiled: January 15, 2010Publication date: July 22, 2010Applicant: HITACHI, LTD.Inventors: Tomokazu SHIMAKURA, Masaki HASEGAWA
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Publication number: 20070194230Abstract: An inspection technique capable of observing a magnetic domain configuration which is formed on a magnetic specimen surface with a higher resolution and at a higher speed as never before. The inspection technique includes an SPLEEM observation unit including a spin polarized electron source, an irradiation optics that projects a spin polarized electron beam that is emitted from the spin polarized electron source to a magnetic specimen having a magnetic domain structure, a stage on which the magnetic specimen is mounted, an imaging optics that focuses and detects the electron beam that is reflected from the magnetic specimen; and cleaning means for cleaning the surface of the magnetic specimen to transfer the magnetic specimen to the SPLEEM observation unit, wherein the magnetic domain structure of the magnetic specimen surface is inspected on the basis of the reflected electron beam.Type: ApplicationFiled: February 8, 2007Publication date: August 23, 2007Inventors: Teruo KOHASHI, Tomokazu Shimakura
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Publication number: 20070057666Abstract: This invention provides a recording media defect inspection technique that makes possible high-speed and high-resolution defect inspection using an electron beam. A spindle motor rotates a recording media while an electron beam is being irradiated on a surface of a recording media, and detectors detect secondary electrons produced from the recording media, whereby unevenness information of the recording media surface is obtained. The obtained unevenness information on the recording media surface is Fourier transformed and a defect is detected. Further, by introducing deposition gas onto the recording media surface by gas introduction means while irradiating the electron beam on the recording media, a component of the deposition gas is deposited in a detected defect position on the recording media surface to form a mark.Type: ApplicationFiled: July 26, 2006Publication date: March 15, 2007Inventors: Tomokazu Shimakura, Teruo Kohashi, Yoshio Takahashi
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Patent number: 6879152Abstract: The magnetic field intensity distribution of a magnetic material sample, such as a magnetoresistive device, is measured with a probe having a tip portion of a magnetic material to which current is made to flow from a power source to the magnetic material. The probe is scanned relative to the surface of the magnetic material sample in two modes. In a first mode, the probe is scanned by being oscillated in a vertical direction to tap a surface of the sample to be tested. In a second mode, the probe is scanned while being held in contact with the measured surface. Corresponding first and second output signals from the two modes of scanning are processed to calculate the magnetic field intensity distribution of the sample magnetic material.Type: GrantFiled: August 30, 2002Date of Patent: April 12, 2005Assignee: Hitachi, Ltd.Inventors: Tomokazu Shimakura, Hiroshi Suzuki
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Patent number: 6744249Abstract: A method and instrument for measuring, with a high spatial resolution, a magnetic or electric field that varies repeatedly at high speed. An electron beam is deflected by passage through a magnetic or electric field to be measured and is allowed to pass through a deflection electrode to thereby be deflected in a direction perpendicular to the magnetic or electric field to be measured. A track of the deflected electron beam is detected by a two-dimensional sensor, and a waveform or pattern is displayed wherein a time base and an axis of the magnetic field to be measured are orthogonal to each other.Type: GrantFiled: May 14, 2002Date of Patent: June 1, 2004Assignee: Hitachi, Ltd.Inventors: Hiroshi Suzuki, Tomokazu Shimakura, Kimio Nakamura
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Publication number: 20030214285Abstract: The magnetic field intensity distribution of a magnetic material sample, such as a magnetoresistive device, is measured with a probe having a tip portion of a magnetic material to which current is made to flow from a power source to the magnetic material. The probe is scanned relative to the surface of the magnetic material sample in two modes. In a first mode, the probe is scanned by being oscillated in a vertical direction to tap a surface of the sample to be tested. In a second mode, the probe is scanned while being held in contact with the measured surface. Corresponding first and second output signals from the two modes of scanning are processed to calculate the magnetic field intensity distribution of the sample magnetic material.Type: ApplicationFiled: August 30, 2002Publication date: November 20, 2003Inventors: Tomokazu Shimakura, Hiroshi Suzuki
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Publication number: 20030042899Abstract: A method and instrument for measuring, with a high spatial resolution, a magnetic or electric field that varies repeatedly at high speed. An electron beam is deflected by passage through a magnetic or electric field to be measured and is allowed to pass through a deflection electrode to thereby be deflected in a direction perpendicular to the magnetic or electric field to be measured. A track of the deflected electron beam is detected by a two-dimensional sensor, and a waveform or pattern is displayed wherein a time base and an axis of the magnetic field to be measured are orthogonal to each other.Type: ApplicationFiled: May 14, 2002Publication date: March 6, 2003Applicant: Hitachi, Ltd.Inventors: Hiroshi Suzuki, Tomokazu Shimakura, Kimio Nakamura