Patents by Inventor Tomoki Kurihara

Tomoki Kurihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating composition for use with an overcoated photoresist
    Patent number: 8927681
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: January 6, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20120034562
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: August 31, 2009
    Publication date: February 9, 2012
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Patent number: 7582360
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: September 1, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20070092746
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: December 5, 2006
    Publication date: April 26, 2007
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald Wayton, Peter Trefonas, Suzzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Patent number: 7163751
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: January 16, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Patent number: 6852421
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20040209200
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: May 12, 2004
    Publication date: October 21, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20040067437
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a component such as a resin that comprises an aryl dicarboxylate group. In a further aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that comprises a solvent component that comprises one or more oxyisobutyric acid esters such as methyl-2-hydroxyisobutyrate.
    Type: Application
    Filed: October 6, 2002
    Publication date: April 8, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20030180559
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: September 26, 2002
    Publication date: September 25, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara