Patents by Inventor Tomoki TETSUKA

Tomoki TETSUKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing method, substrate processing apparatus, and storage medium
    Patent number: 9362106
    Abstract: A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: June 7, 2016
    Assignees: Sony Corporation, Tokyo Electron Limited
    Inventors: Hayato Iwamoto, Yoshiya Hagimoto, Tomoki Tetsuka, Shinichiro Shimomura, Teruomi Minami, Hiroki Sakurai, Hirotaka Maruyama, Yosuke Kawabuchi, Hiroshi Tanaka
  • SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM
    Publication number: 20140080312
    Abstract: A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.
    Type: Application
    Filed: June 5, 2013
    Publication date: March 20, 2014
    Inventors: Hayato IWAMOTO, Yoshiya HAGIMOTO, Tomoki TETSUKA, Shinichiro SHIMOMURA, Teruomi MINAMI, Hiroki SAKURAI, Hirotaka MARUYAMA, Yosuke KAWABUCHI, Hiroshi TANAKA