Patents by Inventor Tomoko Fujii
Tomoko Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11993851Abstract: An aqueous solution for surface treatment, for treating a surface of an alloy, the aqueous solution comprising: a copper compound at a copper ion concentration of 20000 ppm or more and 50000 ppm or less; a heterocyclic nitrogen compound at a concentration of 200 ppm or more and 3000 ppm or less; and a halide ion at a concentration of 2000 ppm or more and 70000 ppm or less.Type: GrantFiled: January 23, 2019Date of Patent: May 28, 2024Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tomoko Fujii, Kazuhiko Ikeda, Shun Fukazawa
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Patent number: 11926904Abstract: Provided are an aqueous composition with which the surface of stainless steel is adequately roughened in an efficient manner with few steps, a method for roughening stainless steel, etc. The problem mentioned above is solved by an aqueous composition for roughening the surface of stainless steel, the aqueous composition including 0.1-20 mass % of hydrogen peroxide with reference to the total amount of the aqueous composition, 0.25-40 mass % of copper ions with reference to the total amount of the aqueous composition, and 1-30 mass % of halide ions with reference to the total amount of the aqueous composition.Type: GrantFiled: June 3, 2020Date of Patent: March 12, 2024Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuhiko Ikeda, Tomoko Fujii, Hiroshi Matsunaga, Satoshi Tamai
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Publication number: 20240063399Abstract: Provided is a chromium-containing steel sheet for a current collector of a nonaqueous electrolyte secondary battery. The chromium-containing steel sheet for a current collector of a nonaqueous electrolyte secondary battery has a chemical composition containing Cr in an amount of 10% by mass or more. A parameter Sa defined in ISO 25178 is from 0.15 ?m to 0.50 ?m inclusive, and a parameter Ssk defined in ISO 25178 is more than 0.Type: ApplicationFiled: December 13, 2021Publication date: February 22, 2024Applicant: JFE Steel CorporationInventors: Takayoshi Yano, Akito Mizutani, Kazuhiko Ikeda, Tomoko Fujii, Hiroshi Matsunaga
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Publication number: 20240044014Abstract: The problem of the present invention is to provide a roughening treatment method in which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good surface quality of the stainless steel after treatment. The above problem is solved by a roughening treatment method for stainless steel, which comprises a roughening treatment step that uses a first aqueous composition, and a post-treatment step that uses a second aqueous composition. Namely, the roughening treatment step is to roughen the surface of stainless steel containing copper or a metal having an ionization tendency larger than copper by bringing the first aqueous composition into contact with the surface, wherein the first aqueous composition comprises 0.1% to 20% by mass of hydrogen peroxide based on the total amount of the first aqueous composition, 0.Type: ApplicationFiled: December 13, 2021Publication date: February 8, 2024Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA
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Publication number: 20240044015Abstract: The problem of the present invention is to provide an aqueous composition with which the surface of stainless steel is sufficiently roughened in an efficient manner with few steps, while maintaining good quality (e.g., thickness) of the stainless steel after treatment. The above problem is solved by the following aqueous composition for roughening the surface of stainless steel. Namely, the aqueous composition comprises 0.1% to 10% by mass of hydrogen peroxide based on the total amount of the aqueous composition, 1% to 30% by mass of halide ions based on the total amount of the aqueous composition, and 0% to 3% by mass of copper ions based on the total amount of the aqueous composition.Type: ApplicationFiled: December 13, 2021Publication date: February 8, 2024Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA
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Publication number: 20240011136Abstract: Provided is a stainless steel foil for a catalyst support of an exhaust gas purifier excellent in both diffusion bonding resistance and brazeability and also excellent in oxidation resistance at high temperatures. The stainless steel foil for a catalyst support of an exhaust gas purifier comprises: a predetermined chemical composition; a parameter Sa defined in ISO 25178 of 0.50 ?m to 3.00 ?m; and a parameter Str defined in ISO 25178 of 0.20 to 1.00.Type: ApplicationFiled: December 13, 2021Publication date: January 11, 2024Applicant: JFE STEEL CORPORATIONInventors: Akito MIZUTANI, Takayoshi YANO, Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA
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Publication number: 20240006621Abstract: It is provided a stainless steel sheet for fuel cell separators with low contact resistance, which can be produced very advantageously in terms of safety as well as mass production. A parameter Sa specified in ISO 25178 is set to 0.15 ?m or more and 0.50 ?m or less, and a parameter Ssk specified in ISO 25178 is set to more than 0.Type: ApplicationFiled: December 13, 2021Publication date: January 4, 2024Applicant: JFE STEEL CORPORATIONInventors: Takayoshi YANO, Akito MIZUTANI, Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA
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Patent number: 11821092Abstract: An etchant capable of selectively etching copper and a copper alloy while suppressing dissolution of nickel, tin, gold, and an alloy thereof. The etchant contains: (A) 5-10.5% by mass of hydrogen peroxide with respect to the total mass of the etchant; (B) 0.3-6% by mass of nitric acid with respect to the total mass of the etchant; (C) at least one nitrogen-containing 5-membered ring compound selected from triazoles and tetrazoles, which may have at least one substituent selected from a C1-6 alkyl group, an amino group, and a substituted amino group having a substituent selected from a C1-6 alkyl group and a phenyl group; and (D) (d1) one or more pH adjusters selected from an alkali metal hydroxide, ammonia, an amine, and an ammonium salt, (d2) a phosphoric acid compound, or (d3) a combination of (d1) and (d2).Type: GrantFiled: November 19, 2019Date of Patent: November 21, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Shun Fukazawa, Tomoko Fujii, Hiroshi Matsunaga
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Publication number: 20220325419Abstract: Provided are an aqueous composition with which the surface of stainless steel is adequately roughened in an efficient manner with few steps, a method for roughening stainless steel, etc. The problem mentioned above is solved by an aqueous composition for roughening the surface of stainless steel, the aqueous composition including 0.1-20 mass % of hydrogen peroxide with reference to the total amount of the aqueous composition, 0.25-40 mass % of copper ions with reference to the total amount of the aqueous composition, and 1-30 mass % of halide ions with reference to the total amount of the aqueous composition.Type: ApplicationFiled: June 3, 2020Publication date: October 13, 2022Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA, Satoshi TAMAI
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Publication number: 20220251714Abstract: The present invention provides: a composition with which the surface of a stainless steel is sufficiently roughened in an efficient manner with few steps; a method for roughening a stainless steel; and the like. The above are achieved by means of a composition for roughening the surface of a stainless steel, said composition containing from 0.1% by mass to 25% by mass of one or more substances that are selected from the group consisting of persulfuric acid and persulfuric acid salts based on the total amount of the composition, and from 1% by mass to 30% by mass of halide ions based on the total amount of the composition.Type: ApplicationFiled: July 22, 2020Publication date: August 11, 2022Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuhiko IKEDA, Tomoko FUJII, Hiroshi MATSUNAGA, Satoshi TAMAI
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Publication number: 20210381113Abstract: The present invention relates to an etchant capable of selectively etching copper and a copper alloy while suppressing dissolution of nickel, tin, gold, and an alloy thereof. This etchant is characterized by comprising: (A) 5-10.5% by mass of hydrogen peroxide with respect to the total mass of the etchant; (B) 0.3-6% by mass of nitric acid with respect to the total mass of the etchant; (C) at least one nitrogen-containing 5-membered ring compound selected from the group consisting of triazoles and tetrazoles, which may have at least one substituent selected from the group consisting of a C1-6 alkyl group, an amino group, and a substituted amino group having a substituent selected from the group consisting of a C1-6 alkyl group and a phenyl group; and (D) (d1) one or more pH adjusters selected from the group consisting of an alkali metal hydroxide, ammonia, an amine, and an ammonium salt, (d2) a phosphonic acid compound, or (d3) a combination of (d1) and (d2).Type: ApplicationFiled: November 19, 2019Publication date: December 9, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Shun FUKAZAWA, Tomoko FUJII, Hiroshi MATSUNAGA
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Publication number: 20210381111Abstract: An aqueous solution for surface treatment, for treating a surface of an alloy, the aqueous solution comprising: a copper compound at a copper ion concentration of 20000 ppm or more and 50000 ppm or less; a heterocyclic nitrogen compound at a concentration of 200 ppm or more and 3000 ppm or less; and a halide ion at a concentration of 2000 ppm or more and 70000 ppm or less.Type: ApplicationFiled: January 23, 2019Publication date: December 9, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tomoko FUJII, Kazuhiko IKEDA
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Patent number: 6945078Abstract: When an optical waveguide is formed by focused femtosecond laser pulses in a pure silica glass to induce a refractive index increase region, a pulse width of femtosecond laser pulses are changed, a peak power of femtosecond laser pulses at the focal point is changed, or both the pulse width and the peak power are changed simultaneously. Under conditions where a pulse width of the femtosecond laser pulses is in a range of 210 to 420 fs and a peak power at the focal point is not greater than 8.7×1011 W/cm2, an optical waveguide having a mode field of 10 to 14 ?m such that an aspect ratio is 1 (one) can be obtained. By doing this, it is possible to control a mode field diameter of an optical waveguide and an aspect ratio of the mode field diameter.Type: GrantFiled: August 21, 2003Date of Patent: September 20, 2005Assignee: Fujikura Ltd.Inventors: Takeshi Fukuda, Shimon Ishikawa, Tomoko Fujii, Ken Sakuma, Hideyuki Hosoya
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Publication number: 20040047578Abstract: When an optical waveguide is formed by focused femtosecond laser pulses in a pure silica glass to induce a refractive index increase region, a pulse width of femtosecond laser pulses are changed, a peak power of femtosecond laser pulses at the focal point is changed, or both the pulse width and the peak power are changed simultaneously. Under conditions where a pulse width of the femtosecond laser pulses is in a range of 210 to 420 fs and a peak power at the focal point is not greater than 8.7×1011 W/cm2, an optical waveguide having a mode field of 10 to 14 &mgr;m such that an aspect ratio is 1 (one) can be obtained. By doing this, it is possible to control a mode field diameter of an optical waveguide and an aspect ratio of the mode field diameter.Type: ApplicationFiled: August 21, 2003Publication date: March 11, 2004Applicant: FUJIKURA LTD.Inventors: Takeshi Fukuda, Shimon Ishikawa, Tomoko Fujii, Ken Sakuma, Hideyuki Hosoya
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Patent number: 6081310Abstract: A reflection-type liquid crystal display device includes a first substrate including a plurality of pixel electrodes arranged in a matrix and switching devices for driving the pixel electrodes. A second substrate includes a counter electrode, and a liquid crystal layer is interposed between the first substrate and the second substrate. The pixel electrodes each include a lower electrode layer and an upper electrode layer. The upper electrode layer is formed of either silver or a silver alloy and is reflective.Type: GrantFiled: November 4, 1998Date of Patent: June 27, 2000Assignee: Sharp Kabushiki KaishaInventors: Yoko Katsuya, Yutaka Takafuji, Atsushi Iwakiri, Tomoko Fujii
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Patent number: 5175268Abstract: Lymphotoxin (LT) mutein (genetically-altered LT) is disclosed that has the following amino acid sequence, or a portion of an active portion of said protein, where 10 to 21 amino acids of LT being deleted from N-terminus and which has Pro or Phe at the N-terminus: ##STR1## Wherein R.sub.1 is Pro or Phe, R.sub.2 is a peptide chain represented by the following sequence:Ala-Gln-Thr-Ala-Arg-Gln-His-Pro-Lys-Met-His-Leu,or a portion thereof and n is 0 or 1.The LT mutein can be recovered in a higher yield and purified more efficiently under mild conditions which does not harm the LT's biological activity, than the whole LT.Type: GrantFiled: October 3, 1989Date of Patent: December 29, 1992Assignee: Takeda Chemical Industries, Ltd.Inventors: Susumu Iwasa, Tomoko Fujii, Ryuji Marumoto, Koichi Igarashi
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Patent number: 4935352Abstract: An animal cell line transformed with an expression vector for an animal cell, the expression vector which contains a DNA segment comprising:(a) a DNA sequence coding for a signal peptide of an animal cell-derived protein,(b) a second DNA sequence coding for a different protein from the signal protein joined downstream of said signal peptide encoding DNA sequence without causing any reading frame shift, and(c) a promoter DNA sequence capable of functioning in an animal cell, wherein the promoter sequence is positioned upstream of the signal peptide encoding DNA sequence, can produce glycosylated proteins advantageously as secretable proteins.Type: GrantFiled: October 16, 1986Date of Patent: June 19, 1990Assignee: Takeda Chemical Industries, Ltd.Inventors: Koichi Igarashi, Reiko Sasada, Tomoko Fujii, Ryuji Marumoto