Abstract: A curable composition for coating comprising: (a) a fluorine-containing highly branched polymer obtained by polymerization of a monomer A having two or more radical polymerizable double bonds in a molecule of the monomer A and a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in a molecule of the monomer B, in the presence of a polymerization initiator C at an amount of 5% by mole to 200% by mole per the number of moles of the monomer A, (b) at least one surface modifier selected from the group consisting of a perfluoropolyether compound and a silicone compound, (c) an active energy ray-curable polyfunctional monomer, and (d) a polymerization initiator that generates radicals by irradiation with an active energy ray; a cured film obtained from the composition; and a hard coating film obtained by use of the composition.

Abstract: A fluorine-containing highly branched polymer obtained by polymerizing a polyfunctional monomer A that has two or more radically polymerizable double bonds and all or a portion of which has a bisphenol structure, a monomer B having a fluoroalkyl group and at least one radically polymerizable double bond, within a molecule, and a monomer C having at least one ring-opening polymerizable group selected from the group including an epoxy group and an oxetanyl group, and having at least one radically polymerizable double bond, within a molecule, under the presence of a polymerization initiator D with an amount of 5% by mole to 200% by mole to the number of moles of the polyfunctional monomer A; an epoxy resin composition including the polymer; and an epoxy resin cured product obtained from the resin composition.

Abstract: A fluorine-containing highly branched polymer obtained by polymerizing a polyfunctional monomer A that has two or more radically polymerizable double bonds and all or a portion of which has a bisphenol structure, a monomer B having a fluoroalkyl group and at least one radically polymerizable double bond, within a molecule, and a monomer C having at least one ring-opening polymerizable group selected from the group including an epoxy group and an oxetanyl group, and having at least one radically polymerizable double bond, within a molecule, under the presence of a polymerization initiator D with an amount of 5% by mole to 200% by mole to the number of moles of the polyfunctional monomer A; an epoxy resin composition including the polymer; and an epoxy resin cured product obtained from the resin composition.

Abstract: A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.

Abstract: A curable composition for coating comprising: (a) a fluorine-containing highly branched polymer obtained by polymerization of a monomer A having two or more radical polymerizable double bonds in a molecule of the monomer A and a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in a molecule of the monomer B, in the presence of a polymerization initiator C at an amount of 5% by mole to 200% by mole per the number of moles of the monomer A, (b) at least one surface modifier selected from the group consisting of a perfluoropolyether compound and a silicone compound, (c) an active energy ray-curable polyfunctional monomer, and (d) a polymerization initiator that generates radicals by irradiation with an active energy ray; a cured film obtained from the composition; and a hard coating film obtained by use of the composition.

Abstract: A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.