Patents by Inventor Tomoko NAGAI
Tomoko NAGAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11986909Abstract: The present invention uses a flux containing a rosin, a solvent, a thixo agent, and an activator. The thixo agent contains a polyamide and a compound represented by general formula (1). The polyamide is a condensate between an amine and at least one selected from aliphatic carboxylic acids and hydroxy group-containing aliphatic carboxylic acids, and has an endothermic peak at a temperature of 120-200° C. In the general formula, R11 represents a hydrocarbon group having 11-30 carbon atoms. R0a represents a hydrogen atom or a hydrocarbon group having 12-31 carbon atoms. R0b represents an n-valent hydrocarbon group having 4-12 carbon atoms. R21 represents an alkylene group having 2-6 carbon atoms. R0c represents a single bond or an alkylene group having 2-6 carbon atoms. n represents 1 or 2. When n represents 1, m represents an integer of 1-3. When n represents 2, m represents 1.Type: GrantFiled: November 17, 2021Date of Patent: May 21, 2024Assignee: SENJU METAL INDUSTRY CO., LTD.Inventors: Kenta Inoue, Nanako Miyagi, Tomoko Nagai, Kazuyori Takagi, Akiko Takaki
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Patent number: 11986910Abstract: The present invention employs a flux which contains rosin, a solvent, a thixotropic agent and an activator. The thixotropic agent contains a polyamide (PA2). The PA2 is a condensation product of an aliphatic carboxylic acid, a hydroxy group-containing aliphatic carboxylic acid and an aliphatic amine having from 3 to 10 carbon atoms; and the aliphatic carboxylic acid includes an aliphatic dicarboxylic acid having from 11 to 20 carbon atoms. With respect to the endothermic amount calculated from the peak area of the differential scanning calorimetry curve of PA2 as obtained by differential scanning calorimetry measurement, the ratio of the endothermic amount within the range of from 50° C. to 190° C. to the total endothermic amount within the range of from 50° C. to 200° C. is 90% or more.Type: GrantFiled: November 17, 2021Date of Patent: May 21, 2024Assignee: SENJU METAL INDUSTRY CO., LTD.Inventors: Kenta Inoue, Nanako Miyagi, Tomoko Nagai, Kazuyori Takagi, Akiko Takaki
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Patent number: 11923020Abstract: A memory device includes a plurality of memory cell transistors, a first word line, a controller, and a storage circuit. Each of the plurality of memory cell transistors stores a plurality of pieces of bit data. The first word line is connected to a plurality of first memory cell transistors in the plurality of memory cell transistors. The controller performs a loop process including repetition of a program loop including a program operation and a first verification operation. The storage circuit stores status information. The controller performs the loop process, then performs a second verification operation, and stores first status data corresponding to a result of the loop process and second status data corresponding to a result of the second verification operation in the storage circuit, in a write operation using the plurality of first memory cell transistors as targets.Type: GrantFiled: February 24, 2022Date of Patent: March 5, 2024Assignee: KIOXIA CORPORATIONInventors: Hiroyuki Ishii, Yuji Nagai, Makoto Miakashi, Tomoko Kajiyama, Hayato Konno
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Patent number: 11913367Abstract: There is provided an exhaust gas purifying catalyst including a substrate and catalyst portions. The substrate includes an inflow-side cells, outflow-side cells, and porous partition walls, each partition wall separating the inflow-side cell from the outflow-side cell. The catalyst portion includes: (group A) first catalyst portions, each first catalyst portion being provided on a surface of the partition wall that faces the inflow-side cell on an upstream side in an exhaust gas flow direction; and (group B) second catalyst portions being provided on a surface of the partition wall that faces the outflow-side cell on a downstream side in the exhaust gas flow direction. Each catalyst portion of one of group A and group B includes at least one oxidizing catalyst layer and at least one reducing catalyst layer, and each catalyst portion of the other of group A and group B includes at least one oxidizing catalyst layer and/or at least one reducing catalyst layer.Type: GrantFiled: April 17, 2019Date of Patent: February 27, 2024Assignees: Mitsui Mining & Smelting Co., Ltd., HONDA MOTOR CO., LTD.Inventors: Hiroki Kurihara, Yusuke Nagai, Shingo Akita, Yoshinori Endo, Takeshi Mori, Takayuki Watanabe, Tomoko Tsuyama
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Patent number: 11833620Abstract: Provided are flux in which solder wettability is improved, and a solder paste in which the flux is used. The flux contains 0.5-20.0 wt % of a (carboxyalkyl)isocyanurate adduct, and 5.0-45.0 wt % of a rosin, and furthermore contains a solvent. The (carboxyalkyl)isocyanurate adduct is a mono(carboxyalkyl)isocyanurate adduct, a bis(carboxyalkyl)isocyanurate adduct, a tris(carboxyalkyl)isocyanurate adduct, or a combination of two or more of these.Type: GrantFiled: January 16, 2019Date of Patent: December 5, 2023Assignee: SENJU METAL INDUSTRY CO., LTD.Inventors: Yutaka Hashimoto, Kazuyori Takagi, Tomoko Nagai, Nanako Miyagi, Kazuya Kitazawa, Akiko Takaki, Kazuhiro Minegishi, Teppei Otsuki, Rina Horikoshi, Ryuichi Tsuda, Hiroyoshi Kawasaki, Masato Shiratori
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Publication number: 20230321768Abstract: The present invention employs a flux which contains rosin, a solvent, a thixotropic agent and an activator. The thixotropic agent contains a polyamide (PA2). The PA2 is a condensation product of an aliphatic carboxylic acid, a hydroxy group-containing aliphatic carboxylic acid and an aliphatic amine having from 3 to 10 carbon atoms; and the aliphatic carboxylic acid includes an aliphatic dicarboxylic acid having from 11 to 20 carbon atoms. With respect to the endothermic amount calculated from the peak area of the differential scanning calorimetry curve of PA2 as obtained by differential scanning calorimetry measurement, the ratio of the endothermic amount within the range of from 50° C. to 190° C. to the total endothermic amount within the range of from 50° C. to 200° C. is 90% or more.Type: ApplicationFiled: November 17, 2021Publication date: October 12, 2023Inventors: Kenta INOUE, Nanako MIYAGI, Tomoko NAGAI, Kazuyori TAKAGI, Akiko TAKAKI
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Publication number: 20230321767Abstract: The present invention uses a flux containing a rosin, a solvent, a thixo agent, and an activator. The thixo agent contains a polyamide and a compound represented by general formula (1). The polyamide is a condensate between an amine and at least one selected from aliphatic carboxylic acids and hydroxy group-containing aliphatic carboxylic acids, and has an endothermic peak at a temperature of 120-200° C. In the general formula, R11 represents a hydrocarbon group having 11-30 carbon atoms. R0a represents a hydrogen atom or a hydrocarbon group having 12-31 carbon atoms. R0b represents an n-valent hydrocarbon group having 4-12 carbon atoms. R21 represents an alkylene group having 2-6 carbon atoms. R0c represents a single bond or an alkylene group having 2-6 carbon atoms. n represents 1 or 2. When n represents 1, m represents an integer of 1-3. When n represents 2, m represents 1.Type: ApplicationFiled: November 17, 2021Publication date: October 12, 2023Inventors: Kenta INOUE, Nanako MIYAGI, Tomoko NAGAI, Kazuyori TAKAGI, Akiko TAKAKI
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Patent number: 11370069Abstract: The object of the present invention is to provide a flux composition and a solder paste composition in which scattering of flux is suppressed. A flux composition comprising an anti-scattering agent represented by formula (1) below, wherein Z is optionally substituted alkylene, R1 and R2 are each independently optionally substituted alkyl, optionally substituted aralkyl, optionally substituted aryl, optionally substituted heteroaryl, optionally substituted cycloalkyl, or optionally substituted heterocycloalkyl, R3 and R4 are each independently optionally substituted alkyl.Type: GrantFiled: April 12, 2018Date of Patent: June 28, 2022Assignee: SENJU METAL INDUSTRY CO., LTD.Inventors: Tomoko Nonaka, Tomoko Nagai
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Publication number: 20210060715Abstract: Provided are flux in which solder wettability is improved, and a solder paste in which the flux is used. The flux contains 0.5-20.0 wt % of a (2-carboxyalkyl)isocyanurate adduct, and 5.0-45.0 wt % of a rosin, and furthermore contains a solvent. The (2-carboxyalkyl)isocyanurate adduct is a mono(2-carboxyalkyl)isocyanurate adduct, a bis(2-carboxyalkyl)isocyanurate adduct, a tris(2-carboxyalkyl)isocyanurate adduct, or a combination of two or more of these.Type: ApplicationFiled: January 16, 2019Publication date: March 4, 2021Inventors: Yutaka HASHIMOTO, Kazuyori TAKAGI, Tomoko NAGAI, Nanako MIYAGI, Kazuya KITAZAWA, Akiko TAKAKI, Kazuhiro MINEGISHI, Teppei OTSUKI, Rina HORIKOSHI, Ryuichi TSUDA, Hiroyoshi KAWASAKI, Masato SHIRATORI
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Publication number: 20200353574Abstract: The object of the present invention is to provide a flux composition and a solder paste composition in which scattering of flux is suppressed. A flux composition comprising an anti-scattering agent represented by formula (1) below, wherein Z is optionally substituted alkylene, R1 and R2 are each independently optionally substituted alkyl, optionally substituted aralkyl, optionally substituted aryl, optionally substituted heteroaryl, optionally substituted cycloalkyl, or optionally substituted heterocycloalkyl, R3 and R4 are each independently optionally substituted alkyl.Type: ApplicationFiled: April 12, 2018Publication date: November 12, 2020Applicant: SENJU METAL INDUSTRY CO., LTD.Inventors: Tomoko NONAKA, Tomoko NAGAI