Patents by Inventor Tomomasa Nishida

Tomomasa Nishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus
    Patent number: 9640368
    Abstract: In a plasma processing apparatus, first to third RF power monitors 94, 94 and 98 are configured to monitor high frequency powers (progressive wave powers), which propagate on first to third high frequency power supply lines 88, 90 and 92 from first to third high frequency power supplies 36, 38 and 40 toward a load side, respectively, and high frequency powers (reflection wave powers), which propagate on the first high frequency power supply lines 88, 90 and 92 from the load side toward the first to third high frequency power supplies 36, 38 and 40, respectively, at the same time. A main controller 82 is configured to control the high frequency power supplies 36, 38 and 40 and matching devices 42, 44 and 46 based on monitoring information sent from RF power monitors 94, 96 and 98.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: May 2, 2017
    Assignees: TOKYO ELECTRON LIMITED, DAIHEN CORPORATION
    Inventors: Naoyuki Umehara, Ryuji Ohtani, Shunichi Ito, Kazutaka Sei, Tomomasa Nishida
  • PLASMA PROCESSING APPARATUS
    Publication number: 20140345802
    Abstract: In a plasma processing apparatus, first to third RF power monitors 94, 94 and 98 are configured to monitor high frequency powers (progressive wave powers), which propagate on first to third high frequency power supply lines 88, 90 and 92 from first to third high frequency power supplies 36, 38 and 40 toward a load side, respectively, and high frequency powers (reflection wave powers), which propagate on the first high frequency power supply lines 88, 90 and 92 from the load side toward the first to third high frequency power supplies 36, 38 and 40, respectively, at the same time. A main controller 82 is configured to control the high frequency power supplies 36, 38 and 40 and matching devices 42, 44 and 46 based on monitoring information sent from RF power monitors 94, 96 and 98.
    Type: Application
    Filed: December 13, 2012
    Publication date: November 27, 2014
    Inventors: Naoyuki Umehara, Ryuji Ohtani, Shunichi Ito, Kazutaka Sei, Tomomasa Nishida